The invention relates to a method for preparing a metasurface
structure based on
silicon dioxide microspheres and
a DNA origami technology, which comprises the following steps: carrying out
DNA modification on a
gold film used in an experiment, and depositing a layer of ssDNA on the surface of the
gold film; the preparation method comprises the following steps: forming a single-layer SiO2
microsphere structure on a
gold film substrate modified with ssDNA through a
Czochralski method, performing
plasma treatment after the substrate is completely dried, putting the substrate into a constant-temperature and constant-
humidity chamber for incubation, performing ultrasonic stripping on SiO2 microspheres in
ultrapure water to form regular ssDNA array sites, depositing a pre-formed
DNA origami structure or
metal nanoparticles on the surface of a gold film, and
drying the gold film to obtain the single-layer single-layer SiO2
microsphere structure. Under the action of complementary base
pairing, the origami structure or the
metal nanoparticles are accurately adsorbed on the array sites, and the surface of the gold film is cleaned to remove the non-specific binding origami structure or the
metal nanoparticles, so that the metasurface structure is formed. The method is simple in process, low in equipment and environment requirements and low in preparation cost, and a paper folding structure can form various nano structures or various metal particles on the surface to form various complex metasurface structures such as a
plasma structure and a chiral structure.