The invention discloses a manufacturing method of a flexible heat-sensitive thin film
resistor array, which belongs to the field of micro-electromechanical systems (MEMS). The method comprises the following steps: firstly depositing a sacrificial layer on a
silicon chip; spin-
coating a PI
prepolymer on the sacrificial layer, and forming a PI thin film by thermocuring; then spin-
coating photoresist, carrying out lithographic patterning, and
sputtering a required
metal heat-sensitive thin film layer; adopting the stripping method to obtain a pattern of the heat-sensitive thin film layer; then spin-
coating the
photoresist, carrying out the lithographic patterning, and then
electroplating for forming an
electrical connection metal layer; removing the
photoresist, and then carrying out heat treatment on heat-sensitive resistors; and finally depositing a
parylene protective layer, removing the sacrificial layer and then obtaining the flexible thin film
resistor array. The flexible heat-sensitive thin film
resistor array has simple process, more reliable
connectivity of the heat-sensitive resistors, and small interference of conductor resistance, and can greatly improve the
measurement precision when being used as a sensing element of a sensor, and be applied in moist,
underwater and other environments under the condition of ensuring the sensitivity of the sensor.