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57results about How to "Affect electrical properties" patented technology

Flexible battery and preparation method thereof

The invention relates to the technical field of batteries, and provides a preparation method of a flexible battery. The preparation method comprises three steps of S1, S2 and S3. The invention furtherprovides the flexible battery, which comprises a flexible battery main body, wherein the flexible battery main body comprises an electrolyte, an electrode assembling body and an outer packaging filmused for packaging the electrolyte and the electrode assembling body, the flexible battery main body is sequentially bent to form a plurality of bending points, a bending gap is formed between the twoadjacent bending points on the same side, and each of the bending gaps is filled with an elastic glue. On one hand, the flat flexible battery main body is bent multiple times in the same direction, the bending structures can eliminate the stress generated by bending during the using process after formation, and the service life of the flexible battery is prolonged; on the other hand, the filled elastic glue can serve as bearing bodies of the stress during stretching and contraction, so that the internal structure of the flexible battery is not affected by stretching and contraction in bending, thus the electrical performance and sealing property of the flexible battery are not affected by bending, and the bending performance is improved.
Owner:柔电(武汉)科技有限公司 +1

Chromium and manganese co-doped perovskite type negative temperature coefficient heat-sensitive ceramic material

The invention provides a preparation method of a chromium and manganese co-doped perovskite type negative temperature coefficient heat-sensitive ceramic material. The method comprises the following step: weighing the following raw materials: 20-55% by atom of La, 5-75% by atom of Cr and 5-40% by atom of Mn; performing wet milling to obtain slurry; drying and grinding the slurry to obtain powder; roasting to obtain perovskite-phase La(CrMn)O3 powder; preparing the powder into block materials; performing two-step sintering method; cooling with the furnace to obtain the chromium and manganese co-doped perovskite type negative temperature coefficient heat-sensitive ceramic material. The chromium and manganese co-doped perovskite type negative temperature coefficient heat-sensitive ceramic material prepared according to the method has the advantages that electrical parameters are that rho25 DEG C=15.2 omega.cm-13823.2 ohm.cm+ / -2%, B25 / 50=2688-3942K+ / -1.5%; the material has the characteristics that the high-resistance, low-B and low-resistance and high-B parameter combination is realized; the consistency is high; the stability is high; the material is recyclable; the material is applicable to measuring and controlling of temperature in wide temperature range, circuit compensating and inhibiting of surge current.
Owner:UNIV OF JINAN

Preparation method for anti-dielectric substrate delamination of multi-layer fss radome

ActiveCN105186131BAvoid the effects of differences in expansion coefficientsImprove selection featuresRadiating element housingsRelational modelDielectric substrate
The invention discloses a preparation method for anti-dielectric substrate delamination of a multi-layer FSS radome. Before the radome is laminated, the polyimide frequency selective surface is plasma activated and the cyanate resin is sprayed for viscosity-increasing treatment; Quantitatively describe the influence of curing process parameters on the internal stress, establish the relationship model between the internal stress of the multilayer frequency selective surface stealth radome and the curing process parameters, and then make the polyimide frequency selective surface into prepreg; select according to the multilayer frequency The circuit design of the surface stealth radome requires the frequency selective surface and the layup sequence design of the composite material dielectric layer, and the layup is carried out according to the layup sequence; after the layup is completed, the autoclave is formed and cured. The invention makes up for the defect that air bubbles are easily trapped when the polyimide frequency selective surface and the dielectric layer prepreg are laminated in the traditional method, and solves the problem that the air bubbles cannot be excluded due to the barrier of the frequency selective surface when the dielectric layer is formed, and separation will occur. layer problem.
Owner:10TH RES INST OF CETC

0.6/1 kv waterproof tensile power cable for shallow seas

The invention discloses a 0.6/1 kV waterproof tensile power cable for shallow seas. The 0.6/1 kV waterproof tensile power cable comprises a cable core, wherein the cable core is formed by twisting three fan-shaped phase line cores, a circular ground line and a filling water-blocking strip together; a wrapping belt is wrapped outside the cable core, a low-density polyethylene inner sheath is firstly extruded outside the wrapping belt, and then a thick steel wire armoring layer is tightly wound; two wrapping belts are wrapped outside the thick steel wire armoring layer, then a medium-density polyethylene isolation sleeve is extruded, two water-blocking belts are wrapped outside the medium-density polyethylene isolation sleeve in a stacked manner, a corrugated aluminum sheath is welded outside the water-blocking belt, asphalt is coated on the corrugated aluminum sheath, and finally a medium-density polyethylene outer sheath is extruded on the outermost layer of the cable. The 0.6/1 kV waterproof tensile power cable has the characteristics of structure stability, low skin effect, large carrying capacity, good water-blocking performance, corrosion resistance, oxidation resistance and the like, and is widely applied to power transmission between a mainland and an island and between islands as well as power transmission traversing bottoms of rivers, lakes and seas.
Owner:WUXI JIANGNAN CABLE

Low-density glass fiber reinforced plastic radome and production process thereof

The invention relates to the field of radomes, in particular to a low-density glass fiber reinforced plastic radome and production process thereof. The radome comprises a first protective cover and asecond protective cover which enclose a hollow water tower shape, and an antenna holding pole arranged in a hollow water tower-shaped cavity formed by the first protective cover and the second protective cover; the first protective cover is provided with a first clamping piece, and the second protective cover is provided with a second clamping piece corresponding to the first clamping piece of thefirst protective cover. The first clamping piece and the second clamping piece are connected so that the first protective cover and the second protective cover can be detachably connected to define ahollow water tower-shaped structure, and an openable and closable window convenient to overhaul is formed in the surface of the second protective cover; the high-wave-transmission fiber cloth layer comprises composite core-spun gauze formed by weaving carbon fiber core yarns and glass fiber weaving yarns and curing resin cured outside the composite core-spun gauze. The glass fiber reinforced plastic has the advantages of the low density, the light weight, the small dielectric constant, the good wave permeability, the high mechanical strength and the long service life.
Owner:DONGGUAN YANCHUN IND CO LTD

Method for removing silicon ridge produced in epitaxial deposition of super-junction high-pressure device

The invention discloses a method for removing silicon ridge produced in epitaxial deposition of a super-junction high-pressure device. The method includes the steps of firstly, depositing a layer of oxide film and / or nitride film on the surface of a silicon chip; secondly etching a deep groove on the silicon chip; thirdly, filling the deep groove with monocrystalline silicon or polycrystalline silicon; fourthly, performing planarization to the surface of the silicon chip by chemical mechanical grinding process, and using the oxide film and / or nitride film as a grinding retaining layer; fifthly, performing back-etching to the part of the oxide film and / or nitride film on two sides of the deep groove by etching process to expose the silicon ridge; and sixthly, etching the silicon ridge to remove by the etching process. The monocrystalline silicon in a bottom cut produced in an oxidation layer due to the fact that etching gas is guided in the epitaxial process can be removed, and accordingly the following gate polycrystalline silicon and the gate oxidation layer are provided with fine surface appearance, the following processes can be prevented from influence of the silicon ridge and certain electric performance of the device is free of influence.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP

High-wave-transmission high-strength carbon fiber glass fiber composite glass fiber reinforced plastic radome and production process thereof

The invention relates to the field of radomes, in particular to a high-wave-transmission high-strength carbon fiber glass fiber composite glass fiber reinforced plastic radome and a production processthereof. The high-wave-transmission high-strength carbon fiber glass fiber composite glass fiber reinforced plastic radome comprises a mounting based mounted on a wall, a protective cover arranged outside the mounting base in an openable and closable covering mode, and an antenna holding pole located in a cavity defined by the mounting base and the protective cover. The glass fiber reinforced plastic base layer comprises in parts by mass: 50-80 parts of unsaturated polyester resin, 5-20 parts of glass fibers, 2-15 parts of carbon nanotubes, 0.5-4 parts of 1, 3-butanediol, 5-30 parts of a heat-resistant modifier, 5-10 parts of a low shrinkage agent, 1-5 parts of a release agent, 5-15 parts of a coupling agent, 1-5 parts of fluorinated graphene, 1-5 parts of an initiator and 1-5 parts of athickener. The high-wave-transmission fiber cloth layer comprises composite core-spun gauze formed by weaving carbon fiber core yarns and glass fiber weaving yarns and curing resin cured outside the composite core-spun gauze. The glass fiber reinforced plastic has the advantages of the small dielectric constant, the good wave permeability, the high mechanical strength and the long service life.
Owner:DONGGUAN YANCHUN IND CO LTD

Domestic control mainboard based on Loongson 2K

The invention discloses a domestic control mainboard based on Loongson 2K. The domestic control mainboard comprises a Loongson 2K chip, a video bus conversion module, a format conversion module, a CAN transceiver, a level conversion module, an audio conversion module, a network chip and a memory used for information storage, which are installed on a PCB. A plurality of blind holes used for connecting a first conductive pattern layer and a second conductive pattern layer are formed in a second dielectric layer, a heat dissipation block with clamping blocks at the two side ends is embedded into a mounting groove of an aluminum substrate, and the clamping blocks of the heat dissipation block are embedded into clamping grooves of the mounting groove; and a plastic sleeve with a through hole allowing a bolt to be embedded in is embedded in a mounting through hole, the upper portion, located above the aluminum substrate, of a plastic sleeve is provided with a wide-opening extension portion, the lower portion, located below the aluminum substrate, of the plastic sleeve is provided with an outer protruding portion, and the blind hole is composed of an arc hole and a conical hole communicated with the bottom of an arc hole. According to the invention, the resistance is reduced, the reliability is improved, efficient real-time acquisition, processing and transmission of signals and battery management are also realized, and the functions of products are conveniently expanded.
Owner:苏州匠致电子科技有限公司

Multilayer segmented conductor type water-blocking power cable with built-in cable

The invention discloses a multilayer segmented conductor type water-blocking power cable with a built-in cable. The center of the cable is equipped with a segmented conductor layer. The segmented conductor layer is formed by assembling a plurality of segmented fan-shaped conductor strand blocks and a fan-shaped strand block water-blocking layer arranged out of each segmented fan-shaped conductor strand block. A water-blocking rope is filled in a center gap after the plurality of fan-shaped strand block water-blocking layers are assembled. A round conductor is arranged in each fan-shaped conductor strand block. A round water-blocking layer is arranged out of each round conductor. Water-blocking blocks are filled in the gaps among the fan-shaped strand block water-blocking layers, a water-blocking tape and silk thread bundles. A polyethylene insulating layer, a vertical structure water-blocking layer, a metal armored layer and an alkali-free glass optical fiber tape are extruded out of the segmented conductor layer in sequence. According to the cable, the conductor water-blocking structure and the external water-blocking structure are combined mutually, the conductor is not oxidized and corroded due to water immersion, the electric performance of the cable is prevented from being influenced and an abnormal cable breakage event is prevented from occurring.
Owner:WUXI JIANGNAN CABLE

A step-by-step printing device for photovoltaic crystalline silicon cells

ActiveCN112937082BAvoid Duplicate PrintingReduce the use of electrical performanceFinal product manufactureScreen printersGratingSilicon cell
The invention discloses a step-by-step printing device for photovoltaic crystalline silicon cells, which includes a material ladder, a placement plate, a first installation frame, a load-bearing plate, a clamping frame, a screw rod, a liquid barrel, an infusion tube, a clamping mold frame, and an infrared sensor , the first printing board, the second printing board, the third printing board, the card mold device and the limit printing device, the bottom of the material ladder is welded and fixed with the installation column, the top of the placement board is provided with a placement slot, and the first The installation frame is fixed on both sides of the top of the material ladder, wire blocks are fixed on both sides of the load-bearing plate, first clamping holes are opened on both sides of the clamping frame, and the step-by-step printing device of the photovoltaic crystal silicon cell is equipped with a first printing board, the second printing board, and the third printing board, it is convenient to print the main grid line, sub-grid line and auxiliary grid line through different printing boards, so as to avoid the duplication of position during the printing process of the main grid line due to the transformation of the overall crystalline silicon cell printing Printing, thereby reducing the electrical performance of the overall crystalline silicon cell.
Owner:徐州中辉光伏科技有限公司

Method for forming semiconductor structure

A method for forming a semiconductor structure comprises the following steps: providing a substrate; forming a gate structure, a first side wall and a second side wall on the substrate; forming a source-drain opening in the substrate by taking the first side wall and the second side wall as masks; removing the second side wall; carrying out ion implantation on the source-drain opening, and forming a suppression layer in the substrate on the side wall and the bottom of the source-drain opening, wherein first ions are doped in the suppression layer; and forming a source-drain doping layer in the source-drain opening. The second side wall and the source-drain opening are firstly formed, and the second side wall is removed after the source-drain opening is formed, so that the injection angle during first ion injection is increased, more injected first ions are diffused into the substrate corresponding to the side wall of the source-drain opening, the surrounding area of the suppression layer is increased, and in the subsequent activation annealing treatment, the second ions in the source-drain doping layer can be diffused in a large area range, so the area of the finally formed source-drain doping region is increased, and the performance of the finally formed semiconductor structure is improved.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
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