The application relates to the technical field of preparation of
rare earth alloy sputtering targets, in particular to a
terbium-based
alloy target and a preparation method thereof. The
terbium-based
alloy target is prepared by introducing specific amounts of Cu, Al, Ce and Ga elements on the basis of Tb, and through the mutual synergistic effect among the elements, a Tb-Cu-Al-Ga-Ce alloy target with
low oxygen content, fine grains, dense and uniform structure and good
processing performance is obtained; further, the alloy target can improve the
sputtering film forming quality, can improve the heavy
rare earth utilization rate and reduce the production cost when used for
grain boundary diffusion of a
neodymium-iron-
boron magnet, can provide a basis for realizing the synergistic promotion of
coercivity and
remanence, and is suitable for large-scale industrial production in high-end application fields such as
new energy vehicles and energy-saving home appliances.