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Terbium-based alloy target and method for manufacturing the same

PendingCN122327053Alow oxidation tendencySave plasticityNew energyAlloy
The application relates to the technical field of preparation of rare earth alloy sputtering targets, in particular to a terbium-based alloy target and a preparation method thereof. The terbium-based alloy target is prepared by introducing specific amounts of Cu, Al, Ce and Ga elements on the basis of Tb, and through the mutual synergistic effect among the elements, a Tb-Cu-Al-Ga-Ce alloy target with low oxygen content, fine grains, dense and uniform structure and good processing performance is obtained; further, the alloy target can improve the sputtering film forming quality, can improve the heavy rare earth utilization rate and reduce the production cost when used for grain boundary diffusion of a neodymium-iron-boron magnet, can provide a basis for realizing the synergistic promotion of coercivity and remanence, and is suitable for large-scale industrial production in high-end application fields such as new energy vehicles and energy-saving home appliances.
Owner:CHINA RARE (SHENZHEN) RESEARCH INSTITUTE CO LTD