The invention discloses a fabrication method of an LED
chip electrode. The fabrication method includes the following steps that:
dry etching is performed on an epitaxial layer, an N type GaN layer is exposed; an
indium tin oxide film conductive layer is fabricated; a
chromium layer is formed through
evaporation; a
nickel layer is formed through
evaporation; annealing treatment is performed on the
nickel layer under a
nitrogen atmosphere, so that the
nickel layer can form uniformly-distributed spherical nickel particles on the surface of the
chromium layer; with the spherical nickel particles adopted as an
etching mask, the
chromium layer is etched, so that nanoscale recessed rectangular pits can be formed on the surface of the chromium layer through
etching; the spherical nickel particles are removed through
corrosion; an aluminized layer, a
titanium layer, a
platinum layer and a
gold layer are formed sequentially through
evaporation; and glue is removed through peeling, and as a result, the LED
chip electrode can be obtained. The invention also discloses an LED
chip electrode; the LED chip electrode includes a chromium layer, an aluminum layer, an evaporation aluminum, a
titanium layer, a
platinum layer and a
gold layer which are distributed sequentially from bottom to top; and nanoscale recessed rectangular pits can be formed on the surface of the chromium layer through
etching. According to the LED chip electrode and the fabrication method thereof of the invention, the nanoscale lumpy structures can be formed on the surface of the chromium layer, so that the exitance of light on the surface of the chromium layer can be increased; light that is reflected into the chip by the aluminum layer and is further reflected out can be increased, and therefore, the luminous efficiency of an LED can be obviously improved.