65results about How to "Increase reverse voltage" patented technology

An object of the present invention provides an n-type Group III nitride semiconductor stacked layer structure of a low resistance having excellent flatness generating few cracks and pits in the uppermost surface. The inventive n-type Group III nitride semiconductor stacked layer structure comprises a first n-type layer which includes a layer containing n-type impurity atoms at a high concentration and a layer containing n-type impurity atoms at a low concentration, a second n-type layer containing n-type impurity atoms at an average concentration smaller than that of the first n-type layer, the second n-type layer neighboring the layer containing n-type impurity atoms at a low concentration in the first n-type layer.

The invention discloses a multiple quantum well structure for a photoelectric device, which comprises n quantum well structures overlapped sequentially. The photoelectric device comprises an N-type semiconductor layer and a P-type semiconductor layer, and is characterized in that the thickness of the barrier layer close to the N-type semiconductor layer is larger than the thickness of the barrier layer close to the P-type semiconductor layer; and n is an integer which is larger than 2 and less than 20. The invention can improve the internal quantum efficiency, and because the barrier layer close to the N layer is wider, the invention can compel holes to move near to the N layer, thereby increasing the number of luminous quantum wells and improving the luminous efficiency of the quantum wells and the brightness. The invention can increase the backward voltage and improve the antistatic property, and because the barrier layer close to the N layer is thicker than the barrier layer close to the P layer, a PN junction is widened when the backward voltage is applied.

A multi-trench termination structure for semiconductor device is disclosed, where the semiconductor device includes a semiconductor substrate and an active structure region. The multi-trench termination structure includes multiple trenches defined on an exposed face of the semiconductor substrate, a first mask layer formed on a partial exposed surface of the semiconductor substrate and corresponding to a termination structure region of the semiconductor device, a gate insulation layer formed in the trenches, a conductive layer formed on the gate insulation layer and protruding out of the exposed surface of the semiconductor substrate, and a metal layer formed over the first mask layer and conductive layer on the termination structure region of the semiconductor device.

Merging together the drift regions in a low-power trench MOSFET device via a dopant implant through the bottom of the trench permits use of a very small cell pitch, resulting in a very high channel density and a uniformly doped channel and a consequent significant reduction in the channel resistance. By properly choosing the implant dose and the annealing parameters of the drift region, the channel length of the device can be closely controlled, and the channel doping may be made highly uniform. In comparison with a conventional device, the threshold voltage is reduced, the channel resistance is lowered, and the drift region on-resistance is also lowered. Implementing the merged drift regions requires incorporation of a new edge termination design, so that the PN junction formed by the P epi-layer and the N<+> substrate can be terminated at the edge of the die.

The invention discloses a Schottky diode and a manufacturing method thereof. The Schottky diode comprises a substrate, a buffer layer, an extension structure, a Schottky contact metal and an Ohmic contact metal, wherein the substrate the buffer layer and the extension structure are sequentially arranged in an overlapped structure; the extension structure comprises a super bonding layer, a GaN channel layer and a barrier layer which are sequentially stacked, and the super bonding layer is composed of a plurality of p-type GaN layer and a plurality of n-type GaN layer which are alternately stacked each other; the Schottky contact metal and the Ohmic contact metal are symmetrically arranged on the opposite two side surfaces of the extension structure, one ends of the Schottky contact metal and the Ohmic contact metal extend to the upper surface of the extension structure, and the other ends of the Schottky contact metal and the Ohmic contact metal extend to the buffer layer. The Schottky diode has relatively high pressure resistance, ensures current transmission capacity and stability and avoids a traditional field plate structure or protecting ring structure, thereby simplifying the manufacturing process and reducing the cost.

The invention discloses a method for substrate epitaxial growth of luminous diode based on AlN template, including processing substrate, growing AlxGa(1-x)N layer, AlyGa(1-y)N layer, SivAlzGa(1-z-v)N layer, N type GaN layer mixed with Si, Inx1Ga(1-x1)N/GaN luminous layer (wherein, x1=0.20-0.25), P type AlGaN layer and P type GaN layer mixed with Mg and cooling. The method enables the simplification of epitaxial growth and improves the production efficiency of LED.

A MOS P-N junction diode device includes a substrate having a first conductivity type, a field oxide structure defining a trench structure, a gate structure formed in the trench structure and a doped region having a second conductivity type adjacent to the gate structure in the substrate. The method for manufacturing such diode device includes several ion-implanting steps. After the gate structure is formed by isotropic etching using a patterned photo-resist layer as a mask, an ion-implanting step is performed using the patterned photo-resist layer as a mask to form a deeper doped sub-region. Then, another ion-implanting step is performed using the gate structure as a mask to form a shallower doped sub-region between the gate structure and the deeper doped sub-region. The formed MOS P-N junction diode device has low forward voltage drop, low reverse leakage current, fast reverse recovery time and high reverse voltage tolerance.

The present invention discloses a nitride light emitting diode with AIN quantum dots and a manufacturing method thereof. The nitride light emitting diode comprises a substrate, a buffer layer, an N-type nitride, multiple quantum wells with V-pits, P-type nitride, AIN quantum dots without Mg doping and P-type nitride and P-type contact layer with high Mg doping, an AIN quantum dot layer is inserted between the P-type nitride and the P-type nitride with high Mg doping, and the quantum dots uniformly block the terminal of a dislocation line through a multistep relaxation deposition method with high-resistance AIN quantum dots. The nitride light emitting diode with AIN quantum dots and the manufacturing method thereof are able to prevent current from flowing the dislocation line area, improve the backward voltage, reduce the electric leakage and improve the current lateral extension and ESD.

It is an object of the present invention to provide a gallium nitride-based compound semiconductor light-emitting device which has a highly reflective positive electrode that has high reverse voltage and excellent reliability with low contact resistance to the p-type gallium nitride-based compound semiconductor layer.

The inventive reflective positive electrode for a semiconductor light-emitting device comprises a contact metal layer adjoining a p-type semiconductor layer, and a reflective layer on the contact metal layer, wherein the contact metal layer is formed of a platinum group metal or an alloy containing a platinum group metal, and the reflective layer is formed of at least one metal selected from the group consisting of Ag, Al, and alloys containing at least one of Ag and Al.

The invention relates to a production technology of controllable silicon, which comprises the following steps of oxidizing, photoetching and penetrating a ring, penetrating and diffusing, diffusing a short base region, and photoetching a cathode. The production technology is characterized in that the step of evaporating aluminum and alloy and retaining an alloy layer is added between the step of photoetching and penetrating the ring and the step of penetrating and diffusing. The production technology has the advantages that 1, as the diffusion rate of the aluminum in the silicon is far greater than that of the boron in the silicon, the production technology takes the aluminum as the penetrating and diffusing impurity source, so that the penetrating and diffusing time of the 4-inch silicon wafer (250-260um) is less than 180h; 2, as the impurity concentration of the aluminum diffusion is lower, the production technology further can effectively improve the backward voltage; and 3, as the transverse diffusion distance is 65-70% and the normal boron diffusion is 80%, the diffusion method can effectively improve the effective use ratio of the area of the chip and reduce the area of the chip.

The invention discloses an LED epitaxial growth method based on a sapphire graphical substrate. The method comprises processing the substrate, growing an AlGaN layer, growing an InAlN layer, growing a MgAlGaN layer, growing a Si-doped N type GaN layer, growing an InxGa(1-x)N/GaN layer, growing a P type AlGaN layer, growing a Mg-doped P type GaN layer, and cooling; and x equals 0.20 to 0.25. According to the growth method, the wavelength hit rate of an epitaxial wafer is improved, the crystal quality of the epitaxial wafer is improved, and the photoelectric performance of an LED is improved.

A method for surface treatment of diamond comprising exposing the surface of diamond to UV light containing wavelengths of 172 nm to 184.9 nm and 253.7 nm at an integrated exposure of 10 to 5,000 J/cm² in an environment of an atmosphere having an oxygen concentration of 20 to 100% and an ozone concentration of 10 to 500,000 ppm to adsorb oxygen on the surface of diamond.

A trenched MOS gate controlled rectifier has an asymmetric trench structure between the active area of active trenches and the termination area of termination trenches. The asymmetric trench structure has a gate electrode on one side of the trench to turn on and off the channel of the MOS structure effectively and a field plate structure on the other side with field dielectric sufficiently thick in order to sustain the high electric field during the reverse bias condition.

The invention discloses a method for manufacturing a fast-recovery glass package diode with an ultra-high voltage above 13,000 V. The method comprises the steps that N type semiconductor silicon materials are adopted as a semiconductor substrate, N+ type impurities are doped on the N type semiconductor substrate, an N+ type impurity layer on one face of the semiconductor substrate is removed, P+ type impurities are dually doped on exposed N- type semiconductor materials, then heavy metal platinum doping is carried out, metallization layers on the two faces of a silicon wafer are manufactured through a vacuum coating technology, a plurality of chips are bonded to a pipe core assembly in a metallurgy mode, the silicon wafer is divided into pipe cores of the needed size, the divided pipe core assembly and a lead assembly are bonded through high-temperature sintering and metallurgy, glass passivation and packaging are carried out, adjusted glass powder paste coats the twelve pipe cores connected in series, and manufacturing of the glass package diode is completed. The method has the advantages of being high in voltage, small in forward direction, fast in reverse restoration, good in high-temperature work stability, high in long-term work stability and the like, and is widely applied to the field of aviation, aerospace, electronics, weapons, ships and the like.

The invention discloses a manufacturing method of an LED epitaxial wafer. By using the method, luminescence area losses can be further reduced, a supplementation layer is increased and growing quality of a quantum well is improved; and a backward voltage is increased, internal electric leakage of a device is reduced, and simultaneously, an In-component gradual-change inclined well layer is used to change a forbidden band width of the well so as to capture more electrons and cavities. Contact areas of the electrons and the cavities are increased. A luminescence area is increased too. Operation speeds of the electrons are reduced and a number of effective electrons which are contacted with the cavities is increased.

The invention relates to a switch mode power supply (202) comprising a switch element (308) comprising an NPN-bipolar transistor (402) and a self-conductive field effect transistor (404). Said bipolar transistor (402) and the field effect transistor (404) are connected to form a cascode (400). A bipolar transistor (402) is electrically connected to a winding (502) of a transformer (504), and an additional winding (508) of the transformer (504) is electrically connected to a base connection (408) of the bipolar transistor (402).

The invention discloses a BOOST power conversion circuit and a control method thereof. According to the conversion circuit, an initial voltage establishing circuit of a flying capacitor C1 is added onthe basis of an input and output common-ground type three-level Boost converter. The initial voltage establishing circuit is composed of a first resistor R1, a second resistor R2 and a third resistorR3. Initial voltage is established for a first capacitor C1 when the voltage of the input end of the voltage-boosting power conversion circuit is lower than starting threshold voltage Vstart of the voltage-boosting power conversion circuit, and the BOOST power conversion circuit has the effects that firstly, forward voltage of a second switching tube T2 is reduced; and secondly, the reverse voltage borne by the fourth diode D4 is reduced, the second switching tube T2 is further protected, and the fourth diode D4 with smaller reverse voltage stress can be selected.

The invention provides an LED epitaxial layer growth method and an epitaxial layer structure and an LED chip obtained through the method. The growth method for the epitaxial layer growth comprises the following steps of growing a P-type AlGaN layer and a first P-Type GaN layer arranged on the top surface of the P-type AlGaN layer; and growing a shield layer between the P-type AlGaN layer and the first P-Type GaN layer, of which the shield layer is a P-type AlGaN/InGaN superlattice structure. In the growing of the P-type AlGaN layer, the growth temperature is 750-800 DEG C; the Al dosage concentration is 1.8E+20-2.2E+20atom/cm<3>;and the Mg dosage concentration is 1E+20-2E+20atom/cm<3>. In the growing of the P-type AlGaN/InGaN superlattice structure, the growth temperature is 850-900 DEG C; the Al dosage concentration is 2E+20-3E+20atom/cm<3>;and the Mg dosage concentration is 1E+20-2E+20atom/cm<3>.In the LED epitaxial layer structure provided by the invention, the P-type AlGaN/InGaN superlattice structure is inserted between the P-type AlGaN layer and the P-Type GaN layer, so that on one hand, deects of large quantities of dislocation of quantum well areas are overcome to prevent leakage passages to form between the dislocation defects and the P-Type GaN layer, and meanwhile, capability of obstructing quantum from overflowing from the multi-quantum well areas are improved.

The invention discloses a light-emitting diode epitaxial wafer and a preparation method thereof. The light-emitting diode epitaxial wafer is characterized by comprising a low-temperature buffer layer GaN, an undoped GaN layer, a uAl superlattice layer, an N-type GaN layer, a first barrier layer, a shallow quantum well layer, a multi-quantum well layer, an electronic barrier layer, an Mg-doped P-type GaN layer and a CTL layer, wherein the undoped GaN layer is located on the low-temperature buffer layer GaN; the uAl superlattice layer is located on the undoped GaN layer; the N-type GaN layer is located on the uAl superlattice layer; the first barrier layer is located on the N-type GaN layer; the shallow quantum well layer is located on the first barrier layer; the multi-quantum well layer is located on the shallow quantum well layer; the electronic barrier layer is located on the multi-quantum well layer; the Mg-doped P-type GaN layer is located on the electronic barrier layer; and the CTL layer is located on the Mg-doped P-type GaN layer. According to the light-emitting diode epitaxial wafer and the preparation method thereof disclosed by the invention, the backward voltage can be significantly improved by adding the uAl superlattice layer structure.

A III-V semiconductor pixel X-ray detector, including an absorption region of a first or a second conductivity type, at least nine semiconductor contact regions of the second conductivity type arranged in a matrix along the upper side of the absorption region, and optionally a semiconductor contact layer of the first conductivity type, a metallic front side connecting contact being arranged beneath the absorption region, and a metallic rear side connecting contact being arranged above each semiconductor contact region, and a semiconductor passivation layer of the first or the second conductivity type. The semiconductor passivation layer and the absorption region being lattice-matched to each other. The semiconductor passivation layer being arranged in regions on the upper side of the absorption region. The semiconductor passivation layer having a minimum distance of at least 2 μm or at least 20 μm with respect to each highly doped semiconductor contact region.