The invention belongs to the technical fields of semiconductors, and particularly relates to an enhancement mode HEMT (
high electron mobility
transistor) device. According to the enhancement mode HEMT device, a reverse polarization layer is grown on the upper surface of a
barrier layer between a grid
electrode and a drain
electrode; the reverse polarization layer and the
barrier layer produce reverse polarization to form two-dimensional hole gas (2DHG) in
heterojunction interface; the reverse polarization layer,
barrier layer, buffering layer form polarization super junctions; meanwhile, a
metal grid
electrode is not positioned between a source electrode and the drain electrode any more, instead, an insulation gate electrode is formed by
etching a groove in the edge of the source edge far from the drain electrode; on one hand, longitudinal conductive channels between the source electrode and two-dimensional
electron gas (2DEG) are
cut by the 2DHG; the
magnetic field control on the conductive channels is realized by applying
voltage on the groove gate electrode so as to realize the enhancement mode; and the regulation and control on the threshold value
voltage can be realized by
doping parts of the conductive channels; and on the other hand, the polarization super junctions between the gate electrode and the drain electrode assist to use up a drifting region in a blocked state so as to optimize the transverse
electric field distribution of the device and improve the
voltage resistance of the device.