The invention belongs to the technical field of localized electrodeposition, and relates to a localized electrochemical deposition method and device for high-efficiency grain refinement, the method comprises the following steps: S1, according to a to-be-processed requirement, carrying out inscribing modification on a
cathode surface of a substrate by using ultrafast
laser to obtain a modified substrate; s2, the modified substrate is fixed in an
electroplating pool, an
anode plate is fixed below the modified substrate in the
electroplating pool, an
electrolyte is added, and the liquid level of the
electrolyte is higher than the upper surface of the modified substrate;
laser is placed above the
electroplating pool, it is guaranteed that the
laser is focused on the
cathode surface of the modified substrate, and establishment of an electro-deposition
system is completed; and S3, electro-deposition parameters and laser parameters are set, a laser focus performs reciprocating scanning in the modified area of the modified substrate, and localized electro-deposition is completed. According to the method, ultrafast laser is introduced into the substrate modification and electrochemical
deposition process, the
machining efficiency and the deposition effect can be improved, and grain refinement can be achieved.