The invention provides a method for growing a
silver telluride single crystal by CVD (
Chemical Vapor Deposition) by taking
silicon-
silicon dioxide as a substrate, which is used for preparing
single crystal Ag2Te, and relates to the technical field of two-dimensional material preparation, and the method comprises the following steps: synthesizing a polycrystalline Ag2Te precursor by a
solid-phase
sintering method: mixing Ag
powder and Te
powder according to a stoichiometric ratio, and carrying out a sealed reaction in a
muffle furnace to generate polycrystalline Ag2Te; the method comprises the following steps:
grinding polycrystalline Ag2Te into
powder, taking the powder as a CVD (
Chemical Vapor Deposition) growth source, and growing
single crystal Ag2Te by taking
silicon-
silicon oxide as a substrate; in the growth process,
argon is adopted as protective gas, and gas washing is completed through vacuumizing and
argon filling circulation. The method has the advantages that high risk caused by direct use of
hydrogen is avoided, the problem of difficulty in
silver telluride separation operation caused by a complex mixed
system is also avoided, meanwhile, silicon-
silicon oxide is used as a substrate for growth, selectivity of the substrate for Ag2Te growth is increased, portability of a transfer material is improved, and the method is suitable for industrial production. The prepared single
crystal Ag2Te has the advantages of large quantity, high quality,
large size and the like.