121results about How to "Readily soluble" patented technology

The invention provides compositions for rapid bowel cleansing comprising a water-soluble mixture of polyethylene glycol and sodium phosphate(s). The compositions are particularly useful for preparing the bowel prior to surgery or diagnostic procedures such as colonoscopies. The invention further comprises methods for cleansing the bowel using these compositions, and bowel cleansing kits comprising these compositions.

The curable casting compound comprises an epoxy resin having at least one aminoglycidyl group in the molecule, a curative, and a fluorosurfactant. In the manufacture of products based on this casting compound, the shaping and curing operation can be shortened considerably.

A process for preparing perfume film chips comprising inclusions of perfume particles.

Surfactant granules are made by the process comprising the steps of (1) mixing an aqueous nonionic surfactant paste and an aqueous solution of an organic polymeric carrier; (2) simultaneously granulating and drying the mixture from step (1) in a fluidized bed to form a granulated nonionic surfactant. The surfactant granules are dust-free, flowable, storage-stable, show no tendency toward clumping and are readily soluble in cold water.

A photosensitive resin composition comprises a base resin (e.g., novolak resins, polyvinylphenol-series polymers), a first photoactive ingredient (e.g., diazobenzoquinone derivatives, diazonaphthoquinone derivatives) and a second photoactive ingredient (e.g., mixtures with azide compounds) each having an absorption range at wavelength lambd1 or lambd2, the wavelengths thereof being different from each other. Between the first and second photoactive ingredients, at least one photoactive ingredient is substantially inert at the absorption wavelength of the other. After exposing the photosensitive resin composition to a light to form a pattern, the whole surface of the photosensitive layer is exposed to a light of the other wavelength to make the surface hardly soluble (in the case a positive pattern is formed) or readily soluble (in the case a negative pattern is formed) in a developer, and developed, thereby forming a pattern of high resolution. Utilizing an existing exposure system, there can be obtained photosensitive resin compositions (especially, resists for semiconductor production) having improved sensitivity and resolution.