The invention relates to a method for measuring impurities in pure silver by an electrical inductance-coupled plasma emission spectrometer, which is characterized by specifically comprising the following steps of: adding sulfuric acid to dissolve a pure silver sample to be measured; completely dissolving the sample to be measured; adding hydrochloric acid, boiling to be clear, cooling, and separating matrix silver of the sample; refining in a precipitating way; replenishing 10% of hydrochloric acid, and setting the volume to be degree scale by deionized water; and turning on the electrical inductance-coupled plasma emission spectrometer, turning on analysis control software, clicking a 'firing' button so as to form stable plasma fire, carrying out full-wave band scanning, correcting a light path, selectively entering a data control program, selecting a spectrum line of an element to be measured, setting a concentration value of a curve, measuring standard curve solution according to the concentration from low to high sequentially, and measuring so as to obtain relevant parameters at data state bars. The method has the advantages of being less in sample consumption, short in test period, multiple in analyzed element types, high in accuracy, good in reliability, high in precision, small in value adding interference, etc.