The invention provides
monocrystalline silicon wafer cleaning equipment and method, and relates to the technical field of
monocrystalline silicon, the
monocrystalline silicon wafer cleaning equipment comprises a cleaning box, a partition plate is arranged in the cleaning box, the cleaning box is divided into an upper heating area and a lower cleaning area by the partition plate, a moving plate is arranged in the cleaning box, the moving plate moves in the upper heating area and the lower cleaning area, and a monocrystalline
silicon wafer is installed on the moving plate; a water tank and a
pickling tank are arranged on the cleaning tank, the water tank and the
pickling tank are both connected with pipelines in a penetrating mode, the other ends of the pipelines extend into the lower cleaning area, and a
liquid storage tank is arranged in the lower cleaning area and matched with the movable plate. The cleaning box is divided into the upper heating area and the lower cleaning area through the partition plate, the moving plate directly drives the monocrystalline
silicon wafer to move between the two areas, manual or auxiliary mechanism carrying is omitted, and the cleaning period is greatly shortened; the whole process of heating, cooling, acid
pickling and
water washing of the monocrystalline
silicon wafer is completed in the closed cleaning box, the monocrystalline silicon wafer does not need to be exposed in the external environment, and the surface cleanliness of the cleaned silicon wafer is ensured.