The invention discloses a multi-mode nanometer measurement
system and method based on terahertz scattering type scanning near-field optical
microscopy and multi-frequency electrostatic force
microscopy, and belongs to the technical field of near-field imaging, the measurement
system comprises an AFM main body, a terahertz source, an
optical path system, a
terahertz detector, a multi-frequency
signal generator and two phase-locked amplifiers; terahertz
waves emitted by the terahertz source reach the
terahertz detector through the
optical path system, and near-field optical signals are obtained. The AFM comprises a
metal coating probe; the multi-frequency
signal generator generates sinusoidal signals with frequencies of
omega1 and
omega2; a sample is placed on the
scanner, and the
cantilever beam is controlled to vibrate at the frequency
omega 1; an alternating
voltage with the frequency of omega 2 is applied to a
metal coating probe arranged at the top end of the
cantilever beam;
laser emitted by the
laser is reflected to the
light spot position detector through the
cantilever beam, and morphology and electrostatic force signals are obtained through the two lock-in amplifiers respectively. According to the invention, a morphology
signal, an optical signal and an electrostatic force signal can be synchronously obtained through single scanning.