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134results about How to "Large horizontal size" patented technology

Foundation-based atmosphere profile microwave detector

The invention provides a foundation-based atmosphere profile microwave detector. The detector is characterized by comprising an antenna feeder unit, a radiometer receiving unit and a scanning mechanism unit, wherein the antenna feeder unit comprises two independent antenna feeder sub-units for two wavebands and is provided with two-frequency independent reflective surfaces; the two independent antenna reflective surfaces are arranged at two ends of the output shaft of a scanning motor respectively, can realize beam scanning through motor rotation, and are used for receiving microwave radiation of atmosphere and an internal calibration reference source; the radiometer receiving unit comprises a directional coupler, a radio amplifier, a power divider, a band pass filter, a square law detector, an integrator and a video amplifier, and is used for realizing intermediate frequency detection of a received signal; the scanning mechanism unit comprises a scanning shaft, a scanning step motor, two front ends and a sub-miniature type A (SMA) connector; and driven by the scanning motor, the scanning shaft drives the two reflective surfaces to circumferentially scan so as to realize observation on sky in different incident angles and measurement on an internal calibration blackbody and acquire data which is acquired in a measurement and periodic internal calibration unit.
Owner:NAT SPACE SCI CENT CAS

SOI horizontal power MOSFET device

The invention provides an SOI horizontal power MOSFET device and belongs to the technical field of power semiconductor devices. A dielectric groove is introduced in a drift region and filled with two or more dielectric materials, and the dielectric coefficients of the dielectric materials are lower than the dielectric coefficient of an active layer and are gradually decreased from bottom to top; the side, close to a body region, of the dielectric groove is of a body region longitudinal extension structure; a semiconductor buried layer opposite to the drift region in doping type is arranged between the dielectric groove and a dielectric buried layer. Because the dielectric groove filled with the variable k dielectric materials has an modulating action on an internal electric field of the active layer and plays a role in longitudinally folding the drift region, the voltage resistance of the device is greatly improved, and the horizontal size of the device is reduced; because of introduction of the body region longitudinal extension structure and the semiconductor buried layer, the voltage resistance of the device is further improved, the exhausting action on the drift region is enhanced, the doping concentration of the drift region can be improved, and therefore the on resistance of the device is reduced; the grid and drain capacitance of the device can be further reduced through the dielectric groove, and the frequency and output power of the device are improved.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

High-property graphene/nylon 6 nanometer composite material and preparation method thereof

The invention relates to a high-property graphene / nylon 6 nanometer composite material and a preparation method thereof. The preparation method comprises the following steps of performing in-situ polymerizing on single-layer high-quality modified graphene and caprolactam, so as to obtain the graphene / nylon 6 nanometer composite material, wherein the modified graphene is very low in adding amount, and has special size and carbon and oxygen ratio. The high-property graphene / nylon 6 nanometer composite material has the advantages that the graphene can realize the functions of a nucleating agent, an enhancing filler, ultraviolet protection and the like in the nylon 6; by adding a small amount of modified graphene, compared with the pure nylon, the mechanical property, high temperature-resistant property, anti-ultraviolet aging property and the like are obviously improved; the graphene has better dispersivity in a polymer matrix, the usage amount is little, the processibility of a final product is good, and the material can be used for industrialized multi-yarn high-speed spinning. The preparation method has the advantages that the preparation technology is simple and effective, the modification on the existing nylon 6 polymerizing equipment is not needed, and the production method is a production technique with market competitiveness.
Owner:HANGZHOU GAOXI TECH CO LTD

Low-cost and high-load specialized plant-protection unmanned aerial vehicle and driving method

InactiveCN104554724AChange the size of the throttleChange the magnitude of the liftAircraft power transmissionLaunching weaponsAviationFlight height
The invention relates to a low-cost and high-load specialized plant-protection unmanned aerial vehicle and a driving method. The unmanned aerial vehicle comprises a flight mechanism, a posture controlling mechanism and a pesticide spraying system which are arranged on a rack, wherein the flight mechanism provides power output for the taking off and landing of the unmanned machine and adjustment of the flight height of the unmanned machine, wherein a posture adjustment mechanism is used for adjusting the aviation and the flight posture of the unmanned aerial vehicle to ensure that the unmanned aerial vehicle is positioned on a scheduled operation route; the pesticide spraying system is used for controlling the pesticide spraying system to spray the pesticide when the plant-protection unmanned aerial vehicle arrives at the scheduled operation area. According to the plant-protection unmanned aerial vehicle and the driving method, transversal type reversed rotation dual rotors driven by an engine are adopted, lift force of a height direction of the unmanned aerial vehicle is provided, and the unmanned aerial vehicle is high in loading capability, long in working time and high in working efficiency; once two pairs of power-driven small rotors are adopted, the thrust required by adjustment of horizontal direction posture and the operation flight of the unmanned aerial vehicle are provided, and the driving of the unmanned aerial vehicle in a three-dimensional space is completely decoupled. The unmanned aerial vehicle has the advantages of simple structure and control principles, convenience in repairing, easiness in learning of remote control operation, and low use and maintenance cost.
Owner:SHANDONG AGRICULTURAL UNIVERSITY

Preparation method of metal nanosheets

The invention discloses a preparation method of metal nanosheets. The preparation method comprises the steps that 1, strong ammonia water is added into a nickel chloride solution, a NaOH solution is added, a hydrazine hydrate solution is added, the solutions are stirred and mixed to be uniform, and a mixed solution is obtained; 2, a substrate can be placed in a lining of a hydrothermal reaction kettle, the mixed solution is transferred into the lining of the hydrothermal reaction kettle, the hydrothermal reaction kettle is sealed, the constant temperature ranging from 80 DEG C to 120 DEG C is kept for 12-24 hours, and crude nickel nanosheets or crude nickel nanosheets growing on the substrate are obtained; 3, the crude nickel nanosheets are repeatedly cleaned multiple times in pure water and ethyl alcohol, drying is conducted, and the nickel nanosheets are obtained. According to the preparation method, the nickel metal nanosheets are obtained through spontaneous growth by means of a mild organic surfactant-free method, the thickness of the nickel metal nanosheets can be controlled to be 10 nanometers or below, the prepared nickel nanosheets are high in quality, the surfaces of the nickel nanosheets are not covered with active agents, and the nickel nanosheets are low in cost and suitable for mass production.
Owner:SOUTHWEAT UNIV OF SCI & TECH

Controllable preparation method of germanium-silicon nano lower-dimension structure and germanium-silicon nano lower-dimension structure

The invention discloses a controllable preparation method of a germanium-silicon nano lower-dimension structure and the germanium-silicon nano lower-dimension structure. The controllable preparation method comprises the following steps of (a) cleaning a silicon substrate; (b) forming germanium-silicon alloy on the silicon substrate in an epitaxial growth mode to form an epitaxial substrate; (c) spreading electron resist and exposing the required germanium-silicon nano lower-dimension structure graph on the electron resist through the electron beam photolithography; (d) transferring the germanium-silicon nano lower-dimension structure graph to the epitaxial substrate through dry etching to obtain a sample; (e) removing the electron resist on the sample; (f) performing oxidation and anneal under a high-temperature environment to enable oxygen to react with silicon preferentially to form silicon oxide and germanium to be separated out; (g) performing anneal in a nitrogen and hydrogen mixing atmosphere to form the germanium-silicon nano lower-dimension structure. By means of the controllable preparation method, controllable preparation of the germanium-silicon nano lower-dimension structure in dimension, shape, position and component is achieved. Furthermore, the controllable preparation method has the advantages of being low in process difficulty, high in repeatability and capable of performing large-scale integration easily.
Owner:HUAZHONG UNIV OF SCI & TECH

Semiconductor laser

The invention discloses a semiconductor laser. The semiconductor laser comprises a lower-part flat plate waveguide and an upper-part ridge waveguide along a growth direction of an epitaxial layer anda ridge width unchanged region at a back side and a ride width narrowing region at a front side along an optical transmission direction, at the ridge width unchanged region, the ridge width of the upper-part ridge waveguide is maintained unchanged, at the ride width narrowing region, the ridge width of the upper-part ridge waveguide is gradually narrowed, the ridge width of a wide ridge end of theride width narrowing region is equal to the ridge width of the ridge width unchanged region, the ridge width of the ridge end of the ride width narrowing region is smaller than the ridge width of thewide ridge end, a narrow ride end is an optical output end, at the ridge width narrowing region, the equivalent refractive index of the upper-part ridge waveguide is gradually reduced with the ridgewidth gradually narrowed until the narrow ridge end approaches the equivalent refractive index of the lower-part flat plate waveguide, the longitudinal size and the transverse size of a base mode of the narrow ridge both are increased, so that the longitudinal scattering angle and the transverse scattering angle of output light both are reduced. The scattering angle of the output light of the semiconductor laser provided by the invention is smaller than the scattering angle of a conventional ridge waveguide-structure semiconductor laser.
Owner:HUAZHONG UNIV OF SCI & TECH
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