The invention discloses an inductively coupled plasma mass spectrometry used for determining trace aluminum molybdenum vanadium titanium niobium in silicon steel, and simultaneous determination of trace aluminum, molybdenum, vanadium, titanium, and niobium in silicon steel via inductively coupled plasma mass spectrometry (ICP-MS) is discussed. Determination parameters are optimized via condition experiments, and it is determined that RF power is 1400W, pump speed is 30rpm, sampling depth is 140, and atomization pressure is 0.90. Sample decomposition is realized using nitric acid, Be and Y mixed inner standard method is used for correcting signal drift caused by high matrix in measuring processes. Isotope 27Al, 98Mo, 51V, 47Ti, and 93Nb are taken as measuring isotopes based on mass spectrum interference conditions in determination; and at the same time, yield of double charged ions and oxide ions is adjusted to be lowest by adjusting instrument parameters so as to reduce influences. Calibration solutions are prepared via matrix matching, working curve is established via standard addition method, and reagent blank is deducted. Determination lower limit of the elements reaches 1<mu>g/g, and element RSD is less than 5.2% when the inductively coupled plasma mass spectrometry is used for determining silicon steel standard samples.