70results about How to "High switching current ratio" patented technology

The invention provides a metal source-drain structure and a forming method thereof. The method includes the following steps of providing a substrate with a Ge layer as the surface, forming an Sn layer on the Ge layer, removing the Sn layer so as to expose a GeSn layer which is the interface between the Ge layer and the Sn layer and forming a metal layer on the GeSn layer. The metal source-drain structure and the forming method thereof can improve the on-off ratio of a component and the electronic barrier height of a Schottky component and have the advantages of being simple, easy to achieve and low in cost.

The invention belongs to the technical field of microelectronics, specifically relates to an organic resistive random access memory (RRAM) with peak shaped bottom electrode and flat top electrode and a manufacture method thereof. The method related by the invention comprises steps of: first manufacturing a substrate with peak figures; and depositing a bottom electrode, spin coating an organic medium layer and depositing a top electrode in turn; finally forming an organic RRAM device with a peak shaped bottom electrode. The RRAM with the peak shaped bottom electrode can form a certain electric field distribution on the medium layer, and the electric field at the peak part is maximum, so conductive filaments are formed preferentially at the peak part, thereby improving the repeatability and current switch rate of the RRAM well. The method of invention is suitable for the organic RRAM device based on filament conduction principle.

The invention discloses a bilinear doping drainage heterogeneous material gate oxide layer graphene tunneling field-effect transistor (DL-HTFETs). The field-effect transistor undergoes P/N type heavy doping at a source region and a drain region, linear doping is carried out on regions, close to a channel, of the source end and the drain end, an oxidation layer close to a source electrode is formed by low-K oxide (SiO2), the oxidation layer close to a drain layer is formed by high-K oxide (HfO2), a conveying model of the novel bilinear doping drainage heterogeneous material gate oxide layer graphene tunneling field-effect transistor is built by means of a quantum mechanics model, and electrical properties of a high-K tunneling field-effect transistor (HK-TFETs), a common gate oxide tunneling field-effect transistor (LK-TFETs), a heterogeneous oxide tunneling field-effect transistor (HTFETs), a common filed-effect transistor and the DL-HTFETs are compared and analyzed by means of the model. As is shown by a research result, the DL-HTFETs have the advantages of low leakage currents, a high current switch ratio, low power consumption and short delay time and the like.

The invention belongs to the field of electrical storage device materials and technologies, and particularly relates to a Flash type electrical storage material and a preparation method of an electrical storage device. The preparation process of the Flash type electrical storage device comprises the steps of preparing a fluorene-triphenylamine conjugated polymer or a mixture of the fluorene-triphenylamine conjugated polymer and a fullerene derivative PCBM into a chlorobenzene solution with the concentration being 5-15mg/mL, then spin-coating the chlorobenzene solution on a piece of clean ITO glass, carrying out vacuum drying, and removing the solvent; and finally plating a top electrode Al on the polymer by using a vacuum evaporation method. An organic electrical storage device prepared by using the method provided by the invention has the characteristics of simple technological operation and low cost. In addition, the electrical storage material in the invention has an electron donor group (triphenylamine) and an electron acceptor (PCBM), so that the prepared storage device has the characteristics of low operating voltage and high switching current ratio, and has good application prospects in the field of information storage.

The invention relates to an indium aluminum zinc oxide thin film transistor based on a gate dielectric layer with high dielectric constant and a full room temperature preparation method thereof. The indium aluminum zinc oxide thin film transistor includes a P<+>-Si substrate, a Ta2O5 gate dielectric layer, double active layers, a source electrode and a drain electrode which are arranged in turn from bottom to top. The preparation method includes the following steps: (1) growing a Ta2O5 gate dielectric layer on a P<+>-Si substrate; (2) growing a first layer of IAZO film on the Ta2O5 gate dielectric layer; (3) growing a second layer of IAZO film on the first layer of IAZO film; and (4) growing a source electrode and a drain electrode on the second layer of IAZO film. An IAZO TFT with excellent performance is prepared in a room temperature environment by exploring and optimizing the sputtering preparation conditions of the Ta2O5 gate dielectric layer. The prepared IAZO TFT shows extremelyhigh electrical performance, and has a broad application prospect in flexible display and integrated circuits in the future.

The invention relates to a bi-material railing nanowire tunneling field effect device and a manufacturing method thereof. According to the bi-material railing nanowire tunneling field effect device, a channel is arranged at the center, and a source region and a drain region are respectively arranged at two ends, and an oxide and a gate electrode are covered at the periphery of the channel in sequence. The manufacturing method comprises the steps: SF6 etching a silicon column on a silicon wafer by using a round silicon nitride hard mask; conducting high-temperature oxidation, corroding and reducing the size of the silicon column to be a set diameter value of 6nm-30nm with HF aqueous solution, and conducting high-temperature oxidation to form a silicon column coated by an oxidation layer with set thickness; completing the preparation of a bi-material railing structure by adopting deposition and photoetching technology; and injecting boron and phosphorus of 1*10<20>cm<-2>/10keV and 5*10<18>cm<-2>/10keV at 120-150 DEG C respectively, and annealing at 900 DEG C/10s-1100 DEG C/10s to prepare the source region and the drain region; completing preparation of a metal electrode by CMOS (Complementary Metal-Oxide-Semiconductor) process; and manufacturing the bi-material railing nanowire tunneling field effect device.

The invention embodiment provides a film transistor, an array substrate and a preparation method thereof, and a display device, and relates to the display technical field; indium element in an active layer of a semiconductor can be reduced in usage, thus solving the rising making cost problems caused by rareness of the indium element; the film transistor preparation method comprises the following steps: using composition technology to form a semiconductor active layer pattern on a transparent substrate, wherein the semiconductor active layer pattern comprises a lanthanum boride pattern.

The invention relates to a method for preparing an indium-aluminum-zinc oxide thin film transistor in a low temperature environment. The multi-element amorphous metal oxide thin film transistor sequentially comprises a substrate, an IAZO active layer, a source electrode and a drain electrode from bottom to top, wherein the source electrode and the drain electrode are grown on the IAZO active layer. The preparation method is carried out at a temperature ranging between 20 DEG C and 70 DEG C and includes the steps of (1) growing an IAZO film on a substrate to prepare an IAZO active layer; (2) placing the generated device in UV-ozone, wherein the processing time is 5 minutes; and (3) growing a source electrode and a drain electrode on the surface of the IAZO active layer so as to obtain the indium-aluminum-zinc oxide thin film transistor. The high-performance IAZO TFT is prepared in the low temperature environment through exploring the optimizing the treatment carried out by UV-ozone on the IAZO active layer.

The invention belongs to the field of semiconductor integrated circuits, and specifically relates to a tunneling field effect device for channel potential barrier height control. The center of the device is provided with a channel, two ends of the channel are provided with a source terminal and a drain terminal of different conductive types, a tunneling junction is formed between the source terminal and the channel, the channel is formed by the adoption of three or more than three potential barrier areas, the energy band of the potential barrier area at the middle section is higher than the energy bands of the channel close to the drain terminal and the source terminal, the device also comprises a gate oxide layer fully covering the channel, and the gate oxide layer is fully covered by a gate electrode. The portion of the channel of the device employs materials of different doping concentrations or types, and three sections or more sections of the potential barrier structures are formed in the channel. According to the simulation research result of the tunneling device structure for channel potential barrier height control, the off-state leakage current of the device can be effectively reduced, the sub-threshold slope is reduced, the short-channel effect and the DIBL effect are suppressed, the transconductance characteristic is good, and comprehensive optimization of the performance of the device is realized.

The invention relates to a core shell structure nanowire tunneling field effect device which comprises a gate electrode (6), a source region (1), a drain region (4), a central region and a gate dielectric layer (5), wherein the central region is in a coaxially symmetrical core shell structure; the core in the core shell structure is made of an insulator material; the shell in the core shell structure is made of a semiconductor material; the gate dielectric layer is completely sleeved into the central region and is used for electrically isolating the central region and the gate electrode; the gate electrode is completely sleeved into the dielectric layer; the grate electrode (6), the gate dielectric layer (5) and the central region are equal in length; and the source region and the drain region are respectively arranged at two sides of the central region. A field effect transistor has low leakage current, high grid-control capability and low subthreshold slope, and the drain induced barrier lowing and the short-channel effect are effectively suppressed, so that various nonideal effects of a ring gate nanowire tunneling field effect device in the size reducing process are reduced, and the comprehensive performance of the device is improved.

The invention provides a drain current-improved thin film transistor. The drain current-improved thin film transistor includes a substrate, a gate insulating layer, an active layer, a source, a drain and a gate. The drain current-improved thin film transistor is characterized in that the active layer is doped, and a doping layer is gradient, or doping concentration is gradient; the gradient of the doping layer is increased from the source to the drain; and the gradient of the doping concentration is increased from the source to the drain. A material with a certain gradient is doped in the active layer, and therefore, when voltage of the source and the drain is boosted, a large number of carriers are adjacent to the drain, and thus, so the drain current at a saturated region will be increased, and a higher switching current ratio can be realized, and the switching speed of the component will become higher.

The invention provides a thin film transistor array substrate, a manufacturing method thereof and a display panel. The thin film transistor array substrate comprises thin film transistors, wherein each thin film transistor is internally provided with an active layer composed of a carbon nanotube semiconductor layer and a non-doped amorphous silicon layer, and the non-doped amorphous silicon layer is arranged between the corresponding carbon nanotube semiconductor layer and a source as well as a drain. Therefore, when the thin film transistor is turned on, electricity is mainly conducted by means of the carbon nanotube semiconductor layer in the active layer, and the carbon nanotube semiconductor layer has high electron mobility and forms a high ON-state current; and when the thin film transistor is turned off, a leakage current is mainly released by means of the non-doped amorphous silicon layer in the active layer, and the leakage current is small, thus the thin film transistor has a high switching current ratio.

The invention discloses a P<+> sidewall non-junction device. The P<+> sidewall non-junction device consists of dual gates, a source region, a drain region, a channel region, gate dielectric layers, P<+> sidewalls and isolation layers. For a conventional non-junction device, when the length of a gate is reduced to 10nm, a leakage current is greatly increased, so that the inhibition of the magnitude of the leakage current becomes an important task of a small-sized device. For the conventional non-junction device, a turn-off current of the device in a turn-off state cannot be effectively controlled only by the control capability of the gate. According to the P<+> sidewall non-junction device, PN junction depletion can be formed for assisting in depletion of the device, and when the device is turned on, the gate controls a P<+> region for weakening the PN junction depletion, so that a turn-on current is not influenced. Compared with the conventional non-junction device, the novel P<+> sidewall tri-gate nanowire non-junction device has great advantages, and the advantages are especially remarkable when the gate is very short. The novel device mainly can improve the characteristics of a sub-threshold slope, a turn-on and turn-off current ratio and the like of the conventional non-junction device.

The invention discloses an ultrathin channel groove tunneling field effect transistor which is composed of a grid electrode, a source region, a drain region, a first channel region, a second channel region, a grid dielectric layer, a first isolating layer, a second isolating layer and buried oxide layer, wherein the grid electrode and the grid dielectric layer arranged on the position of the channel regions, and the isolation layers are arranged at the two sides of the grid electrode. The new structure has an ultrathin channel so that coupling of the grid electrode and the channel can be enhanced, and thus control capability of the grid electrode can be enhanced and tunneling current of a device can be increased. Another characteristic of the structure is that the intrinsic region (low-doped region) of the channel extends to the drain region. In a word, compared with conventional tunneling transistors, the device of the structure is obviously improved in the aspects of the electrical characteristics of subthreshold swing and switching current ratio and stability.

The invention discloses a ferroelectric floating gate memory unit string and a preparation method thereof, and the ferroelectric floating gate memory unit string is characterized in that a channel layer is arranged on the upper side of an insulating substrate, a tunneling dielectric layer is arranged on the channel layer, and a composite unit is arranged on the upper side of the tunneling dielectric layer; the composite unit comprises a floating gate metal layer, a ferroelectric dielectric layer and a first control gate metal layer which are sequentially arranged from bottom to top, and at least two ends of the floating gate metal layer and the first control gate metal layer are covered with first insulating dielectric layers; and a source electrode metal layer and a drain electrode metallayer are embedded at two ends of the upper side of the insulating substrate. According to the ferroelectric floating gate memory unit string provided by the invention, electronic behaviors are controlled through the floating gate metal layer, the constraint effect of a ferroelectric polarization electric field generated by the ferroelectric dielectric layer on charges can be maximized, the storage time is effectively prolonged, the response time is reduced, and the overall performance of the ferroelectric floating gate memory unit string is improved.

The invention relates to an integrated chip of an enhanced and depletion type HEMT (High Electron Mobility Transistor) device and a preparation method. The correlation between the influence of the stress of a dielectric layer on the threshold voltage of the device and the gate line width of the device is used to regulate and control the stress of a barrier layer below a P-type nitride gate layer and change the polarization electric field intensity of the barrier layer. Finally, monolithic integration of P-type nitride gate enhanced and depletion type HEMT devices is realized. When the depletion type semiconductor device is prepared, the P type nitride layer below the gate metal does not need to be etched, etching damage does not exist on the contact interface of the gate metal and the semiconductor, gate electric leakage of the device can be effectively reduced, the switching current ratio of the device is increased, and power consumption is reduced. Compared with a conventional P-type nitride gate enhanced HEMT, the enhanced semiconductor device prepared by the invention has the advantages that the polarization electric field intensity of the barrier layer below the P-type nitride gate layer is weakened, the polarization charge surface density of a heterojunction interface is reduced, and the threshold voltage of the enhanced semiconductor device is further improved.