125results about How to "Small thickness deviation" patented technology

Provided is a sheet press molding method by which a molded product having a small plate thickness deviation is obtained. Such a sheet press molding method is provided with a process in which a molded product (30) having a recess and protrusion pattern portion (32), to which a recess and protrusion pattern (3) is transferred, is formed by pressurizing a sheet-shaped material (20) including 60 vol. % to 95 vol. % of a filler and a resin composition using a pair of molds (40) having the predetermined recess and protrusion pattern (3) composed of recessed portions (3a, 3b, and 3c) and protrusion portions (23a, 23b, 23c, and 23d) in at least one of a pair of the molds, in which the mold provided with a dummy pattern (24) composed of dummy protrusion portions (24a) that offset the difference between the total volume of the protrusion portions (23a, 23b, 23c, and 23d) formed on the inside (14) and the total volume of the recessed portions (3a, 3b, and 3c) disposed between the protruding portions (23a, 23b, 23c, and 23d) and the side surfaces (14b) of the inside (14) and the recessed portions (3a, 3b, and 3c) disposed between the protruding portions (23a, 23b, 23c, and 23d) on the inside (14) is used as a pair of the molds (40).

The invention discloses a low-temperature radiation electrothermal film and a preparation method thereof. The carbon nanometer conductive ink comprises the following components in mass percent: 1 to 5% of carbon nano tube, 94 to 98% of solvent, and 0.2 to 2% of surface active agent. The preparation method comprises the following steps: manufacturing a hot melt adhesive layer on a polyester film; printing a carbon nanometer conductive ink layer onto the hot melt adhesive layer; printing a generating and heating ink layer on the ink layer; manufacturing an electrode; and then hot-processing and compounding the polyester film through a hot melt adhesive film. The low-temperature electric radiant heater film has the characteristics that the peeling strength is high and the electro thermal power can be flexibly adjusted.

The invention provides a preset control method for a thickness flying gauge change of a hot-dip zinc coating. The method comprises the following steps: with a strip steel speed, air knife pressure, and a distance between an air knife and the surface of strip steel as main influence factors and by applying a principal component analysis method, building a thickness preset model of the coating by using a least-square fitting algorithm of a log-log space; carrying out long-term self-adaption adjustment and short-term self-adaption adjustment on the thickness of the coating aiming at the effects of a variable speed, a target thickness and a strip steel substrate thickness on the thickness of the coating existing in the flying gauge change process; and carrying out online updating calculation on thickness model parameters of the coating by using a Kalman filtering algorithm and a smooth filtering algorithm in thickness control, so as to improve the preset accuracy of the model parameters. By adopting the preset control method, the control problems of overlarge thickness deviation of the coating and coating thickness detection lag caused by changes of the target thickness of the coating, the strip steel substrate thickness and the strip steel speed are solved; automatic preset control of the thickness of the zinc coating is achieved; the thickness deviation of the zinc coating is reduced; the thickness control accuracy of the zinc coating is improved; zinc consumption is reduced; the galvanization cost is also saved.

Provided is a method of manufacturing a glass blank for a magnetic recording medium glass substrate, including: manufacturing a glass blank by at least press molding a falling molten glass gob with a pair of press molds both so as to face each other in a direction perpendicular to a direction in which the molten glass gob falls, in which: the molten glass gob is formed of a glass material having a glass transition temperature of 600° C. or more; and when the press molding is carried out so that the molten glass gob is completely extended by pressure and molded into a flat glass between press-molding surfaces of the pair of press molds, at least a region in contact with the flat glass in each of the press-molding surfaces of the pair of press molds forms a substantially flat surface. Also provided are a method of manufacturing a magnetic recording medium glass substrate and a method of manufacturing a magnetic recording medium each using the method of manufacturing a glass blank for a magnetic recording medium glass substrate.

The invention relates to a cathode and anode film of a polymer battery. A cathode and anode film of a polymer battery, which is prepared by using active materials, adding a conductive agent, a pore-forming agent, a solvent and a binder to make a slurry, and then coating it on a polyester film. It is characterized in that: The agent is a mixture of two different molecules of copolymerized vinylidene fluoride-hexafluoropropylene. The present invention mixes two kinds of PVDF with different characteristics as the binder in the film-making process, controls the viscosity of the slurry in a certain range, and effectively improves the fluidity of the slurry in the film-making process; the direct coating method is used to make the film , the process is convenient to operate, the thickness deviation of the cathode and anode films produced is small, the yield is high, and the cost is low, making it possible to commercialize lithium-ion batteries on a large scale.

The high precision tungsten plate producing process is especially suitable for producing high precision shielding tungsten plate for CT machine. The production process includes coating the blank tungsten plate with graphite emulsion of 15-20 wt% concentration, rolling after homogeneous heating, electrolytic polishing and pressurizing flattening. The said process is suitable for production of high precision tungsten plate with thickness deviation within 0.01 mm, flatness within 0.005 mm, lower surface roughness and sizes 0.203x146.05x257.05 mm.

The invention belongs to the technical field of glass pipe manufacturing, and particularly discloses equipment for inner overflow and outer overflow down-draw molding of a glass pipe, and a design method thereof. A purpose of the present invention is to solve the problem of how to produce a glass pipe with excellent surface quality and small thickness deviation. The equipment comprises an inner overflow device and an outer overflow device, wherein the inner overflow device comprises a first annular material supply barrel, a cylindrical core part and an inner overflow disc, and the outer overflow device comprises a second annular material supply barrel, a cylindrical core part and an outer overflow disc. According to the present invention, the flow rate of the glass liquid outflowing from the outlet can be uniformly distributed through the first narrow channel formed in the inner overflow device, the overflow is performed by using the inner overflow disc, the flow rate of the glass liquid outflowing from the outlet can be uniformly distributed through the second narrow channel formed in the outer overflow device, and the glass liquid is subjected to overflow by using the outer overflow disc, such that the good surface characteristic is formed so as to mold the glass pipe with excellent inner and outer surface quality and small thickness deviation.

The invention provides a preparation method of an electro-optical crystal thin film, the electro-optical crystal thin film and an electro-optical modulator, and the preparation method of the electro-optical crystal thin film comprises the following steps: preparing a silicon-on-insulator structure, and preparing a protective layer precursor on top silicon of the silicon-on-insulator structure; etching the protective layer precursor and the top silicon layer by using an etching method to form a protective layer and a silicon waveguide layer, forming a groove structure in the protective layer and the silicon waveguide layer after etching, and enabling the height of the groove structure to be equal to the sum of the thickness of the protective layer and the thickness of the silicon waveguidelayer; filling and coating an isolation layer in the groove structure, and flattening the isolation layer until the isolation layer is flush with the protection layer; removing the protective layer ina corrosion manner, depositing and coating the isolation layer, and flattening the isolation layer; and finally, preparing a functional film layer on the coating isolation layer to obtain the electro-optic crystal film. By adopting the scheme, the silicon waveguide layer is protected by the protective layer, the thickness of the coated isolation layer is controllable, the surface is smooth, the coated isolation layer is bonded with the functional film layer, and the propagation of optical signals is not influenced.

Provided are a method of manufacturing a glass blank, the method including press-molding a molten glass gob under a state in which a separation mark formed on an upper surface of the molten glass gob faces at least one of the molding surface sides of a pair of press molds arranged facing each other in a horizontal direction, when the molten glass gob falls into a space between the pair of press molds, and a method of manufacturing a magnetic recording medium substrate and a method of manufacturing a magnetic recording medium, both using the glass blank.

The invention relates to a chemical vapor deposition furnace. The chemical vapor deposition furnace comprises a crucible used for containing raw materials, a crucible cover used in cooperation with the crucible, a deposition chamber, a material collecting box and a gas guide tube, wherein the crucible, the crucible cover, the deposition chamber, the material collecting box and the gas guide tube are assembled from bottom to top; a plurality of first through holes making the crucible and the deposition chamber communicate are formed in the crucible cover, and a second through hole making the deposition chamber and the material collecting box communicate is formed in the material collecting box; and the chemical vapor deposition furnace further comprises a first heater used for heating the crucible, a dust collecting chamber and a dust collecting chamber cover plate covering the dust collecting chamber are arranged inside the material collecting box, and a third through hole making the dust collecting chamber and the material collecting box communicate is formed in the dust collecting chamber cover plate. The chemical vapor deposition furnace is reasonable in structure, multi-stage collection is carried out on zinc sulfide products, defects such as fog spots, fog layers and patterns do not exist in the prepared zinc sulfide, the overall thickness deviation of the zinc sulfide products is small, and the product conversion rate is high.

The invention discloses a semiconductor monocrystalline silicon multi-wire cutting clamping device. The device comprises a set of clamping plates. Each clamping plate is provided with an arc-shaped groove. The surface of each groove is provided with adhesives. A fixture is connected to any one clamping plate through the adhesives and located at the end, away from the groove, of the clamping plate. According to the semiconductor monocrystalline silicon multi-wire cutting clamping device, the shape of a monocrystalline silicon rod to be cut is changed by using the clamping plates; meanwhile, the difference between the impact state of mortar and the aggregation state of the mortar on side faces during cutting is changed, and the purpose that cutting states in all positions in the vertical direction are equivalent during cutting is achieved; and the thickness deviation of slices can be effectively reduced, the problem of uneven thicknesses of silicon slices is solved, and the device has good application value.

A method for forming multiple coating layers produces a coating construction that has flexibility corresponding to the number of layers of multiple coating layers, by which a multilayer coating film can be produced with small film thickness without adherence of dust to a film surface, a drying fault such as unevenness induced by drying-wind on the film surface, or a coating fault such as a level variation and a streak. The multilayer coating film has a coating surface state of high quality with coating thickness deviation of 3% or less. In the method, a belt-like substrate is continuously fed. A coating/drying step follows, with multiple steps performed in a single unit. A plurality of coating layers are formed by sequentially performing the coating/drying step by multiple units. Finally, the belt-like substrate with the multiple coatings is continuously wound.

[Problem] To provide: a method for efficiently producing a resin-bonded wire saw that stabilizes the step of cutting an ingot and that obtains a smooth wafer in which the thickness of a damaged layer on the wafer surface caused by cutting is small; and an adhesive composition for resin-bonded wire saws that is suitable for said method. [Solution] This method for producing a resin-bonded wire saw comprises: a step of applying, to the surface of a metal core wire, a paste including an adhesive composition, abrasive grains, and a solvent for dissolving the adhesive composition, said adhesive composition being used for producing resin-bonded wire saws in which abrasive grains are firmly fixed to the surface of a metal core wire by means of a resin bond, said adhesive composition for resin-bonded wire saws including, as essential components, 100 parts by weight of a novolac-type phenolic resin, 10-30 parts by weight of a resol-type phenolic resin, and 0.1-5 parts by weight of an amine-based silane coupling agent; and a heating step of heating the applied paste with infrared rays including near-infrared rays, and causing said adhesive composition to undergo a cross-linking reaction.

The invention discloses cover tape raw paper, a manufacturing method of the cover tape raw paper and a cover tape. The cover tape raw paper comprises a surface layer, a bottom surface layer and a middle layer located between the surface layer and the bottom surface layer, wherein the surface layer is a high molecular resin layer; a raw material of the middle layer is long-fiber wood pulp; the bottom surface layer is a high molecular resin layer. The cover tape raw paper disclosed by the invention has the following advantages that 1, the tensile strength and brightness of the raw paper are guaranteed by using bleached long-fiber wood pulp with high strength; 2, the transverse shrinkage rate of the raw paper under a high-temperature condition is reduced through adding an auxiliary material into the middle long-fiber wood pulp layer and the uniformity of wood pulp fibers is improved; 3, the transparency of the raw paper is improved through improving the beating degree of paper pulp and the tightness of the raw paper; 4, the thickness uniformity of the raw paper is improved by adopting a relatively low net application concentration and the auxiliary material and the thickness tolerance is reduced.

The invention discloses a method and device for preparing a polystyrene thin film. According to the method, the volatilization rate of solvent is decreased through the mode of controlling the discharging speed of solvent vapor, and the corrugated degree of the surface of the thin film due to the 'skinning' effect is lowered. Meanwhile, a solvent vapor fumigation levelling technology of high-viscosity fluid is adopted, and thus preparation time cannot be excessively prolonged. A high-viscosity fluid body is weak in mobility, and the surface layer of the high-viscosity fluid body can be re-dissolved under the fumigation action of the solvent vapor, so that the viscosity is lowered, the mobility is slightly enhanced and short-range migration can happen. By means of long-term dynamic rebalancing, surface quality of the thin film can be improved. By the adoption of a heat treatment clamp which is designed and processed in a matched mode, the heat treatment effect is improved, and the surface quality of the thin film is further improved. By the aid of the method, thickness uniformity of the thin film is effectively improved, and thickness deviation is reduced. The polystyrene thin film with the thickness being 10-100 microns, the thickness uniformity reaching 80% or above and the thickness deviation being smaller than +/-20% is successfully prepared through the method.