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87 results about "Radical formation" patented technology

Formation of Radicals. Radical species can be electrically neutral, in which case they are sometimes referred to as free radicals. Pairs of electrically neutral "free" radicals are formed via homolytic bond breakage. This can be achieved by heating in non-polar solvents or the vapour phase.

Rotary silicon wafer cleaning apparatus

It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments. According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.
Owner:FUJIKIN INC +2

Active multifunctional carrier for microorganism self-repairing concrete and preparation method thereof

The invention discloses an active multifunctional carrier for microbial self-repairing concrete and a preparation method thereof. The active multifunctional carrier is composed of a granulation mothernucleus, an internal functional component and an outer protective wall material, wherein the internal functional component comprises a carbonate slow-release component, a volcanic ash active component, an inert filler component and a microbial powder component. The carrier is prepared by a powder granulation technology. The functions of microorganism protection, carbonate slow release and volcanic ash reaction are integrated; firstly, microorganisms are well protected against survival in a harsh concrete internal environment; and secondly, when the crack triggers the carrier to crack, carbonate radicals can be slowly released to compensate the deficiency of carbonate radical formation capability induced by microorganisms in cracks, and meanwhile, the active components in the carrier can be subjected to a pozzolanic reaction with calcium hydroxide dissolved out of the cracks to form C-S-H gel with a gelling effect, so that the self-repairing effect of the cracks is improved through theinterlacing effect of multiple repairing products, and good anti-permeability and mechanical property recovery are achieved.
Owner:YANGZHOU UNIV

Rotary silicon wafer cleaning apparatus

It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support / rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.
Owner:FUJIKIN INC +2
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