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5results about How to "Meet the parameter requirements" patented technology

Cavity gas environment control device and wafer cleaning equipment

The invention discloses a cavity gas environment control device and wafer cleaning equipment, and relates to the field of semiconductor equipment. The cavity gas environment control device comprises a cavity, a fan filtering unit and an exhaust unit, the fan filtering unit and the exhaust unit are arranged on the cavity, and the cavity gas environment control device further comprises an air inlet plate which is arranged at an air inlet of the fan filtering unit and seals the air inlet. The air inlet plate is provided with at least one pipeline air inlet and at least one air inlet; the pipeline system comprises an air inlet pipeline, and the air inlet pipeline is connected to the pipeline air inlet; the air inlet adjusting device is arranged at the air inlet and can open or close the air inlet. The gas environment such as the humidity and the oxygen content of the cavity can be flexibly controlled through the pipeline system and the gas inlet adjusting device, the gas environment of the cavity is controllable, then the parameter requirements of related cleaning processes can be met, and the cleaning quality is improved.
Owner:ACM RES (SHANGHAI) INC

Modeling method and device for combined scattering field of rough surface facing terahertz band

The application relates to a modeling method and device for a combined scattering field of a rough surface in a terahertz frequency band. The method comprises the following steps: performing normalization processing on the normal RCS of a single hemisphere, performing fitting characterization on the result, then correcting an approximate formula of the scattering field of the hemisphere by using the normalized RCS, solving the scattering field of a larger radius hemisphere, constructing a phase factor of the scattering field of the hemisphere at different positions by using the relative position relationship of the hemisphere, deducing a scattering field expression of a hemisphere array based on a vector superposition principle, determining the energy ratio of non-coherent scattering field and coherent scattering field according to the ratio of the area of the planar element covered by the hemisphere to the area of the planar element not covered by the hemisphere, performing vector superposition on the scattering field of the hemisphere array and the scattering field of a smooth flat plate based on the superposition idea of non-coherent and coherent scattering, and solving the scattering field of the hemisphere-flat plate combination after the normal RCS of the hemisphere-flat plate combination is corrected. The method can improve the modeling efficiency of the rough surface in the terahertz frequency band.
Owner:NAT UNIV OF DEFENSE TECH

A reverse design method, apparatus, device, and storage medium for material structures

ActiveCN121565342BImprove development efficiencyMeet the parameter requirementsChemical processes analysis/designBiological modelsFeature vectorThree dimensional microstructure
This application provides a method, apparatus, device, and storage medium for reverse design of material structures, relating to the field of materials design. A three-dimensional feature vector matrix of the sample material is constructed; the three-dimensional feature vectors in the matrix are used to characterize the three-dimensional microstructure features of the sample material. Macroscopic performance parameters of the sample material are extracted and used as model condition information. The three-dimensional feature vectors and model condition information are used to form training data pairs. The conditional diffusion model is iteratively trained using the training data pairs until the training termination condition is met, resulting in the target conditional diffusion model. The target macroscopic performance parameters are input into the target conditional diffusion model to obtain the target three-dimensional microstructure that satisfies the target macroscopic performance parameter conditions. This method enables the reverse design of the three-dimensional microstructure of materials based on required performance, improving material development efficiency and reducing development costs; moreover, the designed structure can more accurately meet the required performance requirements and better fit the actual process.
Owner:ZHEJIANG LAB

Vibration exciter balancing weight

The utility model relates to the technical field of vibration exciter equipment, in particular to a vibration exciter balancing weight which comprises a positioning sleeve, a positioning column and filling media, the filling media are arranged in the positioning sleeve, the positioning column penetrates through the positioning sleeve and the filling media, the two ends of the positioning column are fixedly connected with the positioning sleeve, and the positioning column is used for fixing filling materials and the positioning sleeve. And the filling material is prevented from moving in the positioning sleeve. The whole balancing weight is of an internal and external combined structure, the structure is simple, the stability coefficient is high, the mass of the balancing weight is increased through filling materials, larger eccentric mass can be provided, a vibration exciter can obtain larger exciting force, and the parameter requirements of heavy and large vibrating screening equipment are met.
Owner:LANDSKY TECH TANGSHAN CO LTD

Polymer modified material as well as preparation method and application thereof

PendingCN119638266AImprove adsorption capacitySolve the problem that cannot be used as a filler directlyOther chemical processesWater contaminantsPolymer sciencePolymer modified
The invention relates to a polymer modified material, a preparation method and application thereof, the polymer modified material comprises the following raw materials: loess particles, epoxy resin and a curing agent, the mass ratio of the epoxy resin to the curing agent is (10-11): (4-5); the mass ratio of the loess particles to the sum of the epoxy resin and the curing agent is (97-98): (2-3); the preparation method comprises the following steps: sieving loess with a 12-16-mesh sieve to obtain loess particles with the particle size of less than 2mm; the preparation method comprises the following steps: uniformly mixing epoxy resin and a curing agent according to a mass ratio of (10-11): (4-5) to obtain a mixture A; adding the mixture A into the loess particles until the mixture A is uniformly distributed in the loess particles, and naturally air-drying the obtained mixture B at normal temperature for 2-7 days to completely cure the epoxy resin on the surfaces of the loess particles, thereby finally obtaining the polymer modified material. According to the invention, a layer of polymer film is attached to the surface of loess particles to protect the particles from collapsing when encountering water, and meanwhile, the modified material has better pollutant adsorption capacity.
Owner:XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY