Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

4results about How to "Reduce thermal gradient" patented technology

Production process of protection tube with bi-component insulation paste

PendingCN119408202Aquality improvementreduce thermal gradientTubular articlesFiberglass meshGlass fiber
The invention relates to the technical field of power cables, in particular to a protection tube production process, which comprises the following steps of: (1) weaving and winding anisotropic aramid fibers on the outer wall of a sleeve; (2) carbon fibers are woven and wound on the heterogenous aramid fiber woven layer; (3) the sleeve wound with the anisotropic aramid fiber woven layer and the carbon fiber woven layer is put into a curing oven to be heated and cured; (4) polishing and cleaning the sleeve wound with the anisotropic aramid fiber braid layer and the carbon fiber braid layer; (5) the carbon fiber woven layer is coated with fixing glue, the fixing glue is composed of two components, the carbon fiber woven layer is coated with the first component, and the second component is evenly sprayed on the coating of the first component; the first component is also doped with a fragment-shaped glass fiber net, and the fragment-shaped glass fiber net is used as a filler; and (6) the fixing glue is subjected to curing treatment, the curing temperature is controlled to be 25-45 DEG C, and the curing time is 20-30 hours under the pressure of 0.1-0.2 MPa.
Owner:衡诚能源科技(上海)有限公司

Carbonized aggregate, carbonized product with high carbonization depth and preparation method of carbonized product

The invention provides carbonized aggregate, a carbonized product with high carbonization depth and a preparation method of the carbonized aggregate, and belongs to the technical field of carbon sequestration building materials.The preparation method comprises the following steps that solid waste raw materials, cement, silica fume, a thickening agent, a water reducing agent and water are evenly mixed and subjected to pouring forming, and a green body is obtained; and drying the green body until the water content is 13-20%, and carbonizing and curing to obtain the high-connectivity artificial carbonized aggregate. And stacking a plurality of high-connectivity artificial carbonized aggregates in a mold in advance, pouring the slurry into the mold, maintaining at 25 DEG C for 24 hours, demolding, carrying out microwave pretreatment, and then carrying out carbonization maintenance to obtain the carbonized product. According to the method for constructing the continuous carbon dioxide transportation network by using the high-connectivity artificial carbonized aggregate and the preset aggregate technology, the light high-strength carbonized product with the high carbonization depth is prepared, the compressive strength can reach 39.23 MPa after the carbonized product is carbonized for 1 day, the density is 1711 kg / m < 3 >, the carbonization degree is 43.27%, the carbonization uniformity depth is 50 mm, the carbon fixation amount is 356.2 kg / m < 3 >, and the pre-curing time is 4 h.
Owner:WUHAN UNIV OF TECH

A semiconductor device with a more uniform thermal stress distribution across a chip surface

ActiveCN121985587Bincrease core temperaturelow edge temperatureThermodynamicsDevice material
The application provides a semiconductor device with more uniform thermal stress distribution on the chip surface, which comprises a substrate of a first conductive type, a plurality of rows of units arranged along the longitudinal direction on the substrate, and a plurality of units arranged along the transverse direction in each row, wherein the units are active units, dummy units or dummy gate units; the active units, the dummy units and the dummy gate units are arranged in any proportion in the transverse direction and the longitudinal direction; the thermal stress on the surface of the semiconductor device is customized by adjusting the proportion of the active units, the dummy units and the dummy gate units in different regions or the length of the source region of the active units or the spacing of the units or the mesa width of the units. The semiconductor device adopts a non-repetitive unit structure layout, and the chip surface temperature is adjusted according to the designer's requirements by adjusting the unit layout or the unit structure; the thermal gradient on the chip surface can be reduced, the large thermal mechanical stress borne by the semiconductor package can be reduced, and the service life and reliability of the device and the interconnection structure thereof can be prolonged.
Owner:SAIJING ASIA PACIFIC SEMICON TECH (ZHEJIANG) CO LTD +1

Conductive ceramic low-temperature-speed sintering furnace based on infrared radiation

The utility model discloses a conductive ceramic low-temperature fast sintering furnace based on infrared radiation, which relates to the technical field of low-temperature sintering furnaces and comprises a furnace body and a furnace door, the furnace door is laterally and rotatably connected to the side wall of the furnace body, a base is arranged in the furnace body, a bearing piece is placed at the upper end of the base and comprises a bearing plate, and the bearing plate is arranged on the furnace body. A fixing frame is fixed to the upper end of the bearing plate. The utility model discloses a conductive ceramic low-temperature-speed sintering furnace based on infrared radiation. By forming the through holes in the frame and arranging the aluminum foil reflecting film on the side face of the fixing frame, the penetration and reflection effects of infrared radiation are enhanced, heat loss is reduced, and the sintering efficiency is improved; the distance between a clamping plate and a supporting rod of the adjusting assembly can be flexibly adjusted, small-size ceramics can be supported, large-size ceramics can be stably supported, and the applicability is improved; and the porous aluminum plate is adopted as the bearing plate, so that the heat gradient is reduced, and the cracking risk caused by uneven thermal stress of the ceramic is reduced.
Owner:ZHEJIANG UNIV OF TECH