The invention discloses a gas purification reactor. The gas purification reactor is used for absorbing impurities in gas, and comprises at least one gas purification chamber, wherein the gas purification chamber is of a tubular structure, and is filled with a gas purifying material, and the temperature T1 of the gas purification chamber is not smaller than 300 DEG C and not larger than 600 DEG C.A gas purification method comprises the steps: filling the gas purification chamber of the gas purification reactor with the gas purifying material, heating the gas purification chamber to a corresponding temperature T1, heating a gas buffer chamber to a corresponding temperature T2, introducing gas into a gas inlet of the gas purification reactor, and performing discharge from a gas outlet. Through arrangement of a reasonable temperature range for the gas purification chamber, the activity of the gas purifying material can be adjusted, and the purification effect is improved; through arrangement of the gas buffer chamber, the gas flow rate is buffered, and the gas is preheated; through arrangement of a partition plate between the gas buffer chamber and the gas purification chamber, gas flow is dispersed, the gas flow rate is reduced, the gas flow is prevented from driving the gas purifying material to flow, and the purifying material is prevented from getting out of the partition plate under the impact action of the gas flow.