349results about How to "No bending" patented technology

A sensor magnet holder is formed such that a cylindrical portion, a flange portion formed by increasing the diameter of one end part of the cylindrical portion, a magnet rear-end engagement portion formed at the other end part of the cylindrical portion, and four plate-like snap fit tongues are formed integral with one another. The cylindrical portion including the flange portion has, on its inner diametral side, a press fit portion to be press-fitted to a motor shaft. The four plate-like snap fit tongues have respective magnet front-end engagement portions formed on an outer diametral side of their tip portions. The four snap fit tongues are brought into contact with respective flat inner surfaces of the sensor magnet having four flat inner surfaces, by utilizing elasticity of the snap fit tongues. The sensor magnet is retained between the magnet rear-end engagement portion and the magnet front-end engagement portions.

A second conductivity type impurity diffusion layer and an antireflection film are formed on one side of a first conductivity type semiconductor substrate. A glass-containing first electrode material is coated on the antireflection film. A passivation film is formed on the other side of the semiconductor substrate. A plurality of opening parts, which reaches the other side of the semiconductor substrate, is formed in at least a part of the passivation film. A second electrode material containing the first conductivity type impurity element is coated so as to embed the plurality of opening parts and so as not to come into contact with the second electrode material in the adjacent opening part. A third electrode material is coated onto the passivation film so as to come into contact with the coated whole second electrode material. After coating the first electrode material and the third electrode material, the semiconductor substrate is heated at a predetermined temperature. The above constitution can realize simultaneous formation of a first electrode, which passes through the antireflection film and is electrically connected to the impurity diffusion layer, a high-concentration region, in which, on the other side of the semiconductor substrate, the first conductivity type impurity is diffused in a higher concentration than the other region of the semiconductor substrate, and the second and third electrodes electrically connected to the high-concentration region.

The invention discloses a superlift device and further provides a crane which is provided with the superlift device. The superlift device comprises a telescopic arm, a superlift support, a first tension device, a second tension device and a third tension device, wherein a fixed end of the superlift support is connected with the telescopic arm, the first tension device is arranged between a movable end of the superlift support and the end portion of the telescopic arm, the second tension device is arranged between the movable end of the superlift device and the root portion of the telescopic arm, one end of the third tension device is connected with the telescopic arm, a connecting point of the end of the third tension device and the telescopic arm is located between the end portion of the telescopic arm and a connecting point between the telescopic arm and the fixed end of the superlift support, and the other end of the third tension device is connected with the movable end of the superlift support. By means of the technical scheme, when the crane lifts a too heavy object or an erector arm extends out too long, defects of insufficient support force and unstable erector arm caused by the fact that the telescopic arm bends to one side due to the tension which is endured by the telescopic arm can be overcome, and the lifting performance is improved.

The objective of the invention is to provide products of uniform quality, by eliminating harmful effects by the sagging of a belt-like substrate by self weight in exposure and aligning the belt-like substrate and photomasks to high dimensional accuracy. In an exposure device, a belt-like substrate 1 is exposed for each predetermined length region while intermittently sending the belt-like substrate 1 along its longitudinal direction. The flexible belt-like substrate 1 having sensitive material stuck surfaces to be exposed is moved by a drive unit 19 between a feeding reel 14 and a take-up reel 15. A vertical path, in which the belt-like substrate 1 becomes a vertical state is formed between the feeding reel 14 and the take-up reel 15. An exposure section is located in the vertical path. The exposure section has photomasks 21, 22. Patterns drawn in the photomasks 21, 22 are transferred to the surfaces of the belt-like substrate 1 to be exposed by the lights from light sources.