3results about How to "High nitriding efficiency" patented technology

The application discloses a low-temperature ion nitriding method and application. The low-temperature ion nitriding method comprises the following steps: under a selected temperature condition, ion etching treatment is performed on the surface of a workpiece by adopting an arc-enhanced glow discharge process, and then plasma nitriding treatment is performed on the workpiece by adopting an arc-enhanced plasma process to obtain a nitriding workpiece; wherein, a positive and negative alternating voltage is applied to the workpiece in the arc-enhanced plasma process. The low-temperature ion nitriding method provided by the application can realize nitriding at a lower temperature, effectively improves the deformation degree of the workpiece, and is widely applicable to surface strengthening of cutters, molds and metal parts.

This invention discloses a method for preparing nitride thin films, belonging to the field of advanced functional thin film material preparation technology. The method employs pulsed laser deposition technology and includes the following steps: placing an alloy target material prepared according to the stoichiometric ratio of the target thin film in a deposition chamber, evacuating to a background vacuum ≤, heating a single-crystal substrate to 400-1000℃, turning on a 13.56MHz radio frequency ion source and adjusting the power to 50-500W for ionizing nitrogen gas; injecting ammonia or nitrogen gas with a purity ≥99.999% into the chamber through a high-speed pulse valve with a response delay ≤50μs and an opening / closing time ≤200μs, precisely synchronized with the laser pulse electronic signal; the high-energy metallic plasma plume generated by the laser pulse ablation of the alloy target material undergoes an instantaneous gas-phase reaction with the synchronously injected reactive gas, while simultaneously bombarding the substrate surface with a high-energy nitrogen ion beam, controlling the deposition parameters to deposit a nitride thin film on the substrate, which can be cooled after in-situ annealing.

This invention discloses a special gas nitriding material rack for double-ended bolts in wind turbines, comprising a frame body and a support assembly. The support assembly is used to fix the double-ended bolts and is arranged circumferentially along the frame body. The support assembly includes a first support plate and a second support plate, which form an angle. The first support plate is fixed to the frame body, and the second support plate is rotatably mounted on the frame body. The angle between the first and second support plates can be adjusted by rotating the second support plate to clamp double-ended bolts of different sizes. This invention ensures sufficient contact between the double-ended bolts and ammonia gas, improving the nitriding effect.