The invention discloses a preparation method of a high-performance
titanium dioxide film, which comprises the following steps: firstly, preparing
titanium dioxide
colloid by using a
sol-
gel method, and adding an anionic surfactant
sodium 1-octanesulfonate in the process of preparing TiO2
sol to increase the repulsive force among
colloid particles so as to prevent the
colloid particles from gathering and
settling and improve the stability of the colloid; and then selecting a
silicon wafer with a P-type (100)
crystal face as a bottom selection, spin-
coating, and carrying out heat treatment to obtain the
titanium dioxide film. The
silicon wafer has high carrier (
electron and hole) mobility, so that the
conductivity of the material is improved; the structure has high flatness and lattice parameter consistency, and the
repeatability in the preparation process is improved. The preparation method is convenient to operate, simple in equipment and low in cost, and the prepared
titanium dioxide film is high in stability, tight in combination with the substrate, high in
piezoelectric constant and outstanding in catalytic performance and has wide application prospects in the fields of sensors, environmental
pollution control and
artificial intelligence.