34results about How to "Sufficient productivity" patented technology

An antireflection film having a hard coat layer prepared on one side of a transparent substrate directly or through other layers, and further an antireflection layer laminated on a surface of the hard coat layer, wherein the antireflection layer is formed by a dry cured film obtained from a solution comprising a siloxane oligomer (A) obtained by condensation polymerization after partial hydrolysis of a hydrolyzable alkoxy silane that contains a tetra alkoxy silane represented by a general formula (1): Si(OR)4 (where R represents methyl group or ethyl group) as a principal component and a compound (B) having a fluoro alkyl structure and a polysiloxane structure, is excellent scratch-proof property, stain resistance, and cured in a short period of time at comparatively low temperature.

There is provided a glass substrate which has the properties required in the use as a substrate for an information recording medium of the next generation such as a perpendicular magnetic recording system, and can be applied as a substrate for an information recording medium of the next generation particularly on the premise of using the glass substrate in a dynamic environment. More particularly, there is provided a glass substrate for an information recording medium which has sufficiently high surface hardness, has a good balance between specific gravity and mechanical strength, and has high strength to withstand high speed rotation or drop impact, and which can be produced with a high productivity adequate for a direct press method, without the occurrence of bubbles in the glass blank or reboil upon pressing even if arsenic components or antimony components are not substantially used. A glass substrate for an information recording medium, includes, as expressed in terms of percent by mass on the oxide basis: 52 to 67% of SiO2, 3 to 15% of Al2O3, and 0.2 to 8% of P2O5, the glass substrate having a Young's modulus of 85 GPa or greater, a specific gravity of 2.60 or less, and a ratio of Young's modulus to specific gravity (Young's modulus / specific gravity) of 33.0 or greater.

An unsaturated monocarboxylic ester compound has at least two structures represented by the following general formula (1):wherein R1 represents a hydrogen atom or an alkyl group of 1 to 6 carbon atoms, and R2, R3 and R4 independently represent a hydrogen atom, an alkyl group of 1 to 6 carbon atoms, an aryl group, an aralkyl group, a cyano group, a fluorine atom, or a furyl group. A curable composition comprises (A) the unsaturated carboxylic ester compound having two or more structures represented by the general formula (1) mentioned above, (B) a polymerization initiator, and optionally (C) a diluent.

A pneumatic tire is provided which has sufficient total properties and mass productivity of a tire without reducing drainage capability due to narrowed circumferential grooves, achieves high design flexibility of tread patterns and stiffness of land portion as intended, and also effectively reduces undesired air column resonance noise produced by the circumferential grooves. The pneumatic tire includes a circumferential groove 3 which continuously and circumferentially extends in a straight line and arranged on a tread 1, and resonators 5 which are open to the circumferential groove 3 and terminate in a land portion 4, each of the resonators 5 being configured with an air chamber 6 open toward a land portion surface, and a narrowed neck 7 for communication between the air chamber 6 and the circumferential groove 3, and the narrowed neck 7 has the plane maximum width w0 which is within a range of from 3 to 50% of the plane maximum width w1 of the air chamber 6.

A thin film for a reflection film or for a semi-transparent reflection film, having a compound phase formed of at least one chemical compound selected from the group consisting of a nitride, an oxide, a composite oxide, a nitroxide, a carbide, a sulfide, a chloride, a silicide (excluding silicon), a fluoride, a boride, a hydride, a phosphide, a selenide and a telluride of aluminum, magnesium, tin, zinc, indium, titanium, zirconium, manganese and silicon, dispersed in a matrix formed of silver or a silver alloy. The thin film may disperse at least one compound selected from the group consisting of a nitride, an oxide, a composite oxide, a nitroxide, a carbide, a sulfide, a chloride, a silicide, a fluoride, a boride, a hydride, a phosphide, a selenide and a telluride of silver, gallium, palladium or copper, in addition to aluminum or the like, therein. The thin film of the present invention keeps its reflectance without significant loss even after a long period of use, and can prolong the life of various devices which comprise the thin film as a reflection film, such as an optical recording medium and a display. The thin film can be also applied to semi-reflective / semi-transparent film used in the optical recording medium.

The polishing solution for copper polishing of the invention comprises a first organic acid component which is at least one type selected from among an organic acid containing a hydroxyl group, an organic acid salt and an organic acid anhydride, an inorganic acid component which is at least one type selected from among a dibasic or greater inorganic acid and an inorganic acid salt, an amino acid, a protective film-forming agent, an abrasive grain, an oxidizing agent and water, wherein the inorganic acid component content in terms of inorganic acid is 0.15 mass % or greater, the amino acid content is 0.30 mass % or greater, the protective film-forming agent content is 0.10 mass % or greater, based on the entire polishing solution for copper polishing, and the ratio of the first organic acid component content in terms of organic acid with respect to the protective film-forming agent content is at least 1.5.

Variation of charged amount accompanying production amount change does not affect photograph performance, a flexible production of an optimal amount corresponding to commercial scene needs may be performed, and a silver halide emulsion having monodispersibility may be produced with sufficient productivity. In the first line a series of continuous operations are performed that a silver salt aqueous solution, a halide salt aqueous solution, and a hydrophilic dispersion medium aqueous solution are mixed and reacted to generate silver halide grain nuclei, and a mother liquor containing the silver halide grain nuclei is stored in cooled state until a amount of production reaches a desired production amount of a silver halide emulsion. A series of continuous operations are performed at least once that when an amount of formation reaches the desired production amount, the cooled mother liquor is ultra-filtrated in the third line to eliminate, to dehydrate, and to concentrate unnecessary salt generated in the formation reaction, and the mother liquor after ultra-filtrated and an addition liquid containing silver halide ultrafine grains prepared in the second line are instantaneously mixed continuously to grow the silver halide grain nuclei.

The present invention relates to a textile material processing machine which has a plurality of combing devices (X1-X16), at least one cotton sliver (Z) for combing is separately supplied to the combing devices (X1-X16), a cotton sliver (B) is separately formed by mixing the fiber materials combed and transported from the combing heads (X1-X16), then the cotton sliver (B) is transported to the follow drafting device (S) by a guider (FB), the drafting device is provided with adjacent sliver paving devices (BA). In order to provide a comber with simple structure, the comber is arranged with a plurality of combing heads which loading cotton slivers, the combing devices (X1-X16) are suggested to be installed adjacent to each other in a row (G1,G2) on the supporting frame (8), the supporting frame is configured with at least two supporting point on the ground (0), and free room (FR) is formed between the combing devices (X1-X16) and the ground (O). Transport arrangements bring the supply cans in a direction at right angles to the material flow (D) towards the drafting system (S).