The invention discloses a preparation method and application of an active and passive integrated thin-film
lithium niobate /
lithium tantalate photonic device, and belongs to the technical field of
integrated optics. The preparation method comprises the following steps: providing a
lithium niobate /
lithium tantalate substrate, and carrying out patterned injection of
erbium ions on the
surface layer of one side of the substrate to form an
erbium-doped region; carrying out high-temperature annealing treatment on the substrate; and carrying out structure
processing on the substrate subjected to high-temperature annealing treatment to form a
waveguide structure on one side where the
erbium-doped region is located, bonding the
waveguide structure on the carrier substrate, and forming a
lithium niobate /
lithium tantalate film on the body substrate to obtain the active and passive integrated film
lithium niobate /
lithium tantalate photonic device. According to the invention, the scheme of first
doping and then
thinning is adopted, the subsequent high-temperature process is prevented from influencing the quality of a bonding interface and a thin film, the photonic integrated device with high erbium-doped quality and high luminous efficiency is realized, meanwhile, the process compatibility is realized, the yield and reliability are improved, and the production cost is reduced. And a technical
route is provided for realizing a large-scale and multifunctional
lithium niobate / lithium
tantalate photon integrated
chip.