6 results about "Ethyleneimine" patented technology

This invention discloses a poly(amylated oxime-ethyleneimine) modified foam-like mesoporous silica, its preparation, and its application, belonging to the fields of environmental energy chemistry and new materials technology. Firstly, using Pluronic P123 / mesotriene as a pore-forming / expanding agent and tetraethyl silicate as a raw material, foam-like mesoporous silica is obtained through hydrolysis, aging, high-temperature pore expansion, and calcination. After activation, epoxy-modified foam-like mesoporous silica is obtained through a silanization reaction. Subsequently, polyethyleneimine-modified foam-like mesoporous silica is prepared by reacting amino groups with epoxy groups. Then, it is reacted with acrylonitrile to obtain poly(acrylonitrile-ethyleneimine) modified foam-like mesoporous silica. Finally, it is reacted with NH2OH·HCl to obtain poly(amylated oxime-ethyleneimine) modified foam-like mesoporous silica. The poly(amylated oxime-ethyleneimine) modified foam-like mesoporous silica of this invention exhibits extremely high adsorption capacity and extremely fast adsorption rate for uranyl ions, and demonstrates high affinity, selectivity, and good reusability, making it applicable to large-scale seawater uranium extraction projects.

This radioactively labeled compound is represented by formula (1). In formula (1), M represents a radioactive metal ion. A represents a chelate moiety coordinated to the radioactive metal ion. B represents a first atomic group having a structure in which ethyleneimine is polymerized. C represents a second atomic group having a molecular weight of 5000 or less and capable of binding to a molecule expressed in a tumor cell. The second atomic group preferably includes a linear or cyclic peptide. The second atomic group also preferably includes 1-50 amino acid residues.

A polyethyleneimine production method provided herein includes a polymerization step for polymerizing ethyleneimine at a temperature of 30°C or higher in the presence of a superacid, wherein the polymerization step is performed using an alcohol / water mixed solvent. According to this production method, polyethyleneimine having a high secondary amine content can be produced even under mild conditions.

The antibody is a radioactive metal-labeled antibody including an antibody labeled with a radioactive metal. The radioactive metal-labeled antibody further includes a functional chelate linker conjugated to the antibody, and, the functional chelate linker includes: a chelating moiety capable of coordinating to a radioactive metal ion; and a functional unit having a function of enhancing intracellular retention. The functional unit preferably has a structure in which ethyleneimine or ethylene glycol is polymerized or a structure capable of binding to cathepsin B. The functional unit preferably has a structure in which ethyleneimine is polymerized with a polymerization degree of 1 to 7.

One mode of the present invention provides an etching method that, even when an etching liquid is re-used, can suppress rate variability between the etching rate when the etching liquid is used for the first time and the etching rate when the etching liquid is re-used.　In one mode, the present disclosure pertains to an etching method comprising a step for etching an etching target layer containing a group-6 element metal, by using an etching liquid containing phosphoric acid, nitric acid, and the following component A. If the etching liquid contains a group-6 element metal, the etching method comprises a step for adding the following component A to the etching liquid before performing the etching. Component A: At least one compound selected from compounds having a repeating unit derived from ethyleneimine, compounds having a repeating unit derived from allylamine, and compounds having a repeating unit derived from diallylamine.

In one aspect, provided is an etching method capable of suppressing a variation in rate between an etching rate at the time of initial use of an etching solution and an etching rate at the time of reuse of the etching solution even when the etching solution is reused.SOLUTION: The present disclosure, in one aspect, relates to an etching method including a step of etching a layer to be etched containing a Group 6 element metal using an etching solution containing phosphoric acid, nitric acid, and the following component A, the etching method including a step of adding the following component A to the etching solution before the etching in a case where the etching solution contains a Group 6 element metal. At least one compound selected from a compound having a repeating unit derived from ethyleneimine, a compound having a repeating unit derived from allylamine, and a compound having a repeating unit derived from diallylamine SELECTED DRAWING: None