The invention relates to the technical field of solar cells, and discloses a grid
line structure for a
solar cell, a manufacturing method of the grid
line structure and the
solar cell. The grid
line structure comprises a non-contact channel induction
electrode and a plurality of contact auxiliary grids which are distributed at intervals, the
contact type auxiliary grids and the non-
contact type channel induction electrodes are alternately arranged and are parallel to each other, so that the
contact type auxiliary grids and the non-contact type channel induction electrodes are not in contact with each other, and / or each contact type auxiliary grid is in cross
electric contact with the corresponding non-contact type channel induction
electrode; the contact type auxiliary grid penetrates through the
passivation layer and then makes
ohmic contact with the
silicon substrate, and the non-contact type channel induction
electrode makes contact with the surface, away from the
silicon substrate, of the
passivation layer so that
potential difference can be formed between the non-contact type channel induction electrode and the surface of the
silicon substrate. The surface
sheet resistance, the grid
line resistance and the
surface field effect
passivation effect are optimized by optimizing the grid line structure, the carrier transverse
transmission loss is reduced,
Auger recombination of high-concentration
doping is avoided, the
filling factor, the open-circuit
voltage and the conversion efficiency of the
cell are improved, the working procedure is simplified, and the cost is reduced.