The invention discloses a method for producing a dual damascene structure. The method comprises the following steps of: depositing a part of silicon-containing coating in a through hole; then depositing a bottom antireflective coating; carrying out interconnected groove etching; and when the silicon-containing coating is exposed, introducing CF4, N2 and Ar and continuously etching, or introducingCF4, N2 and Ar for etching and then introducing CF4, N2, Ar and C4F8 and continuously etching. In the environment of the CF4, the N2 and the Ar, the ratio of the etching rate of the silicon-containing coating to the etching rate of a dielectric layer with a low dielectric constant can reach 1.1; in the environment of the CF4, the N2, the Ar and the C4F8, the ratio of the etching rate of the silicon-containing coating to the etching rate of the dielectric layer with the low dielectric constant can reach 3, thereby over etching of the silicon-containing coating is extremely realized when the interconnected groove etching is carried out. Therefore, the method is beneficial to enabling the top of a through hole and the bottom of the interconnected groove to form a circular corner, avoids the damage to the side of the interconnected groove and enables the interconnected groove to keep vertical.