This invention discloses a pixelated
scintillator screen based on a Si-SiO2 array (SOA), its fabrication method, and its applications, belonging to the field of X-
ray imaging materials technology. This
scintillator screen uses a low-dimensional
perovskite halide Cs5Cu3Cl6I2
single crystal as the
scintillator medium. The low-refractive-index SiO2 layer enables
total internal reflection guided by vertical photons, while the
Si substrate simultaneously provides high X-
ray transmittance and visible light absorption, effectively reducing optical
crosstalk. Through a vacuum-assisted melt infiltration process, the Cs5Cu3Cl6I2
single crystal is uniformly filled into the SOA channels, forming a well-confined scintillator structure that suppresses lateral scattering and enhances longitudinal
photon transmission. Compared with traditional thin-film scintillators, the SOA-based design significantly improves imaging performance, achieving a resolution of 20.10 lp·mm. ‑1 Spatial resolution and 35 nGy·s ‑1 The method achieves the lowest detectable
dose. Furthermore, the fabrication process is highly scalable, allowing for the flexible construction of scintillator arrays with customized pixel sizes and layouts. This approach provides a promising strategy for achieving next-generation X-
ray imaging with both
high resolution and
low dose sensitivity.