The utility model discloses a
plasma processing device which comprises a cavity and a coaxial
electrode assembly, a
reaction chamber is arranged in the cavity, and the cavity is connected with a gas input
assembly and a vacuumizing unit. The coaxial
electrode assembly comprises a tubular high-
voltage electrode and a grounding electrode, the high-
voltage electrode is connected with a high-frequency power supply, and the grounding electrode coaxially sleeves the high-
voltage electrode to form a
discharge gap; the high-voltage electrode is a hollow
pipe body, micropores are formed in the side wall, and the gas input assembly conveys process gas to the
discharge gap through the hollow
pipe body and the micropores. According to the structure, the high-voltage electrode adopts the hollow
pipe body structure design, the side wall of the hollow pipe body is provided with the micropores, and process gas is directly conveyed to the
discharge gap through the hollow pipe body and the micropores, so that uniform gas distribution is ensured, and the
plasma generation efficiency is improved; and meanwhile,
powder uniform
fluidization and efficient
plasma treatment are achieved. And through the rotatable design of the cavity, the
powder agglomeration is further broken, and the surface treatment uniformity of the plasma on the
powder is improved.