The invention provides a high-purity fine-grain
tantalum target material and a preparation method thereof, and relates to the technical field of preparation of
refractory metal target materials, and the preparation method comprises the following steps: preparation of
tantalum ingots, first
forging of blanks, first heat treatment, second
forging of blanks, second heat treatment, rolling, third heat treatment and
machining. According to the preparation method, firstly, a
tantalum strip is smelted into a tantalum cast
ingot, then the tantalum cast
ingot is sequentially subjected to
forging, rolling, heat treatment and
machining, the pure tantalum target material is finally obtained, crystalline grains in tantalum are fully crushed and refined through large-deformation forging and pressing deformation, the phenomenon that local crystalline grains are not uniform is further reduced, and therefore the equiaxed
crystal tantalum target material with the crystalline grain size
ranging from 15 micrometers to 25 micrometers is obtained; and the grains can be further refined while the structure uniformity is ensured, and the requirement of
coating on the high-purity fine-grain tantalum target material is met.