The invention discloses a preparation method of an addressable disc ultramicro
electrode array for electrochemical imaging, which comprises the following steps of: 1, preparing a
nanowire array by using an ultrathin
slicing machine as
processing equipment and a
silicon wafer with a micron groove array structure as a template; 2, transferring the
nanowire array to a
silicon wafer, performing three-dimensional alignment on a
molybdenum mask plate with a lead pattern and the
nanowire array, and realizing
lap joint of a lead and the
nanowire array and preparation of the lead by combining a
physical vapor deposition method; 3, resin is poured on the
silicon wafer for normal-temperature curing, and the pattern is transferred to the resin; 4, macroscopic wire
lap joint and packaging are carried out, a resin block with an embedded array structure is obtained, the end face is trimmed through an ultra-thin
slicing machine, the
dot array is exposed, and preparation of the addressable disc ultramicro
electrode array is completed. According to the method, the addressable disc ultramicro
electrode array which is high in consistency, high in spatial resolution and capable of being expanded at will can be prepared simply and efficiently at low cost.