2results about How to "Reduce degumming" patented technology

The application discloses a polyvinyl alcohol chemical-proof glove and a manufacturing method thereof, and belongs to the field of glove materials and processing technology. In order to solve the problem of uneven flexibility and thickness of the existing gloves, the polyvinyl alcohol chemical-proof glove and the manufacturing method thereof are provided, and the glove comprises an inner lining layer and a PVA outer layer, and a water-based latex blending layer is formed between the PVA outer layer and the inner lining layer. The water-based latex blending layer is made of raw materials in the following weight proportions: PVA: 10-90; water-based latex: 140-200; glycerol: 8.0-15; polyglycerol: 5.0-15; high-molecular water-absorbing resin I: 2.0-4.0; defoaming agent: 0.5-1.5; bridging agent I: 0.5-2.0; and water: 300-400. The application can effectively reduce the probability of hydrogen bond formation between PVA molecular chains, destroy the regular structure of the film, reduce the crystallinity, thereby reducing the hardness of PVA, and improving the softness and thickness uniformity of the glove.

The invention provides a light-emitting diode and a manufacturing method thereof, and belongs to the field of light-emitting devices. The method comprises the following steps: manufacturing an insulating material layer covering an epitaxial layer; the insulating material layer is patterned to form a current blocking layer and an insulating material mask layer, the insulating material mask layer covers the step area of the epitaxial layer, and the insulating material mask layer exposes the isolation groove area of the epitaxial layer; manufacturing a transparent conductive material layer covering the epitaxial layer and the current blocking layer; manufacturing a first photoresist mask layer on the transparent conductive material layer, wherein the first photoresist mask layer exposes the step region and the isolation groove region; under the shielding of the first photoresist mask layer, performing graphical processing on the transparent conductive material layer to obtain a transparent conductive layer; and under the shielding of the first photoresist mask layer, performing graphical processing on the insulating material mask layer and the epitaxial layer in the step region and the epitaxial layer in the isolation groove region, and forming a step and an isolation groove on the epitaxial layer.