The invention relates to a preparation method of micro-opto-
mechanical system, comprising the following steps: forming a patterned high-reflection film, a top
silicon electrode and a detection
electrode on the top
silicon of a first SOI
silicon wafer; the patterned top silicon of a second SOI silicon
wafer and the high-reflection film together form a movable filter structure, and the bottom of the patterned
metal support column is connected to the top silicon; aligning and bonding the movable filter structure layer
wafer prepared by S3 to the top of the fixed filter structure layer wafer prepared by S2, and bonding the
metal support column in the movable filter structure to the
metal support column in the fixed filter structure to form a support column; taking a standard wafer after
polishing on both sides as a cap layer, and preparing a metal Pad point on the front of the cap to connect with a vertical conductive lead; the beneficial effects of the invention are: the preparation method is compatible with optical and MEMS preparation processes, can be
mass-produced, and the micro-opto-
mechanical system prepared by the method has the advantages of high integration, large optical
duty cycle, large electrostatic driving force, easy integration with detectors, etc.