The invention relates to a
heterojunction solar cell with a buried grid structure, which comprises an N-type
monocrystalline silicon substrate, anodes, cathodes, two
layers of transparent conductive thin films and a plurality of film
layers prepared and formed on the front and the back surfaces of the N type
monocrystalline silicon substrate; each of the film
layers prepared and formed on the front surface of the N type
monocrystalline silicon substrate comprises a P type hydrogenated nanometer
silicon film layer and a P type heavily-doped hydrogenated nanometer
silicon carbide film layer and forms a p+ / p high-low junction; the two layers of transparent conductive thin films are respectively prepared and formed on the outermost layers of the front surface and the back surface of the N type monocrystalline
silicon substrate; grooves are formed on the front surface of the N type monocrystalline silicon substrate; the anodes of the
cell are arranged in the grooves; and the cathodes of the
cell are arranged on the back surface of the N type monocrystalline silicon substrate. The
heterojunction solar cell has the beneficial effects that the P type heavily-doped hydrogenated nanometer
silicon carbide film layer is used as a
broadband gap window layer, the adsorption of visible light is increased, and a higher built-in
electric field is formed in heavy
doping; the shading area of a gate line is reduced by utilizing a grooving technology; and the performance of the
solar cell is improved by hydrogenated nanometer silicon with high electrical property and photoconduction, so that the purposes of high efficiency and low cost are realized.