3 results about "Heat deposition" patented technology

The present application provides a magnetic layer having a coercive force Hc of 2.00 kOe or more and a residual magnetization Mrt per unit area of 2.00 memu / cm2 or more, which is achieved without using a non-magnetic underlayer for promoting in-plane orientation of the magnetic layer and without performing heat deposition 2 The above in-plane magnetization film, in-plane magnetization film multilayer structure, hard bias layer, magnetoresistance effect element, and sputtering target. The in-plane magnetization film has: a preliminary magnetic layer (12A) containing Co, Pt, and a non-magnetic grain boundary material and having a thickness of 1 to 32 nm; and a magnetic layer main portion (12B) formed on the preliminary magnetic layer (12A) and containing Co, Pt, and a non-magnetic oxide, the above non-magnetic grain boundary material of the preliminary magnetic layer (12A) containing at least one of a Zn oxide and a Ta oxide.

The application discloses a high-energy outgoing electron protection device for a neutral beam injection negative ion source, belongs to the field of the neutral beam injection negative ion source of magnetic confinement nuclear fusion, and mainly comprises a protection plate, a supporting base, a thermocouple and an infrared thermal imager. The protection plate is used for intercepting high-energy outgoing electrons. The supporting base is used for mounting and positioning the protection plate in a beam line vacuum chamber. The thermocouple is used for realizing real-time monitoring of the local temperature of the protection plate. The infrared thermal imager is used for observing a large-area heat source of the protection plate and determining the heat deposition position distribution of the high-energy outgoing electrons. The application realizes protection of heat load sensitive components such as a cryogenic pump by intercepting the high-energy outgoing electron beam and monitoring the deposition position of the high-energy outgoing electron beam, promotes the performance improvement and scheme perfection of an electron suppression means, is favorable for long-pulse stable operation of the negative ion source, and can effectively protect the high-energy outgoing electron in the neutral beam injection negative ion source.

This invention belongs to the field of catalyst technology, and relates to a surface-reconstructed heterojunction catalyst, its preparation method, and its application. The preparation method includes the following steps: dissolving cobalt salt, iron salt, and praseodymium salt in deionized water, heating and spraying the solution onto a support to obtain praseodymium-doped cobalt-iron layered double hydroxide; mixing the praseodymium-doped cobalt-iron layered double hydroxide with a phosphorus source and calcining under an inert atmosphere to obtain praseodymium-doped CoP / Fe2P; and subjecting the praseodymium-doped CoP / Fe2P to electro-oxidation treatment to obtain Pr6O. 11 Cluster-modified CoFeOOH heterojunction catalysts. Through the synergistic application of spray thermal deposition-phosphating-electrooxidation techniques, stable construction and electrochemical activation of the heterojunction interface were achieved, significantly improving the catalyst's corrosion resistance and resistance to chlorine evolution competition in chlorine-containing alkaline systems. An overpotential of only 223 mV was required to reach 100 mA·cm⁻¹. ‑2 The current density is maintained at a stable level for 500 hours.