6results about How to "Guaranteed accuracy and reliability" patented technology

The utility model discloses a garbage incinerator flue gas oxygen concentration online detection analyzer and a garbage incinerator. The analyzer comprises a filter unit, a cooling unit, a gas-water separation unit, a heating unit, an oxygen concentration detection unit and an online correction unit, the filtering unit, the cooling unit, the gas-water separation unit, the heating unit and the oxygen concentration detection unit are sequentially connected through pipelines; the online correction unit comprises a plurality of standard oxygen tanks, and oxygen with different concentrations is stored in the standard oxygen tanks; and each standard oxygen tank is connected with the oxygen concentration detection unit. The oxygen concentration detection device has the advantages of accuracy and reliability in oxygen concentration detection and the like.

The application relates to the technical field of semiconductor processing processes, and discloses a mask pattern optical proximity correction method, device, equipment and storage medium, the mask pattern optical proximity correction method comprises the following steps: performing topography prediction on a polishing surface of a wafer to be processed to obtain polishing surface topography information; correcting a focal plane parameter in a simulation optical model according to the polishing surface topography information; and performing optical proximity correction on an initial mask pattern by using the corrected simulation optical model to obtain a corrected mask pattern. In the application, the polishing surface topography information of the wafer to be processed is predicted first, and the focal plane parameter in the simulation optical model is corrected based on the polishing surface topography information, so that the accuracy and reliability of optical proximity correction of the initial mask pattern based on the simulation optical model are ensured, and the processing precision of semiconductor photolithography based on the mask pattern is improved.

The invention relates to the technical field of coal bed gas exploration, in particular to a visualization method for simulating micro occurrence and flowing of deep coal rock gas. According to the visualization method for simulating the microscopic occurrence and flowing of the deep coal rock gas, in-situ pressure, temperature and crustal stress parameters of a preset burial depth are estimated, and simulation boundary conditions including the in-situ pressure, temperature and crustal stress parameters are loaded into a molecular model, so that a simulation boundary consistent with an actual deep environment is directly established, and the real deep coal rock gas microcosmic occurrence and flowing are simulated. And the technical bottleneck that in-situ complex conditions cannot be reproduced in a laboratory is solved, so that a simulation result is closer to engineering practice, and the accuracy and reliability of a visual result are ensured. According to the visualization method, calculation of free-state methane is introduced in a targeted mode, so that the method is more adaptive to the characteristic that the proportion of the free-state methane in the deep coal and rock gas is high, and it is guaranteed that the visualization method can more accurately simulate the actual situation of the deep coal and rock gas.

The present application relates to the technical field of mask lithography, and discloses a hot spot layout correction method, device and equipment in a mask layout and a storage medium, the hot spot layout correction method comprises determining a hot spot layout in an initial mask layout; determining the environmental graphic parameters of each contour edge segment in the hot spot layout; constructing a basic optimization objective function according to the edge placement error varying with the displacement amount of the contour edge segment; superimposing an optimization compensation term on the basic optimization objective function according to each environmental graphic parameter to obtain an optimization objective function; optimizing the displacement amount of each contour edge segment according to the optimization objective function to obtain the corrected displacement amount corresponding to each contour edge segment, so as to determine the corrected layout of the hot spot layout. The present application realizes the automatic correction of the hot spot layout without manual operation, improves the correction efficiency of the hot spot layout, and ensures the accuracy and reliability of the correction result.

This application provides a request rewriting method, apparatus, device, and computer storage medium. The method includes: acquiring an information query request for implementing model training operations; determining the rewriting category to which the information query request belongs; determining positive and negative rewriting samples corresponding to the information query request based on the rewriting category; training a model based on the information query request, positive and negative rewriting samples to obtain a request rewriting model; and performing a request rewriting operation using the request rewriting model. In this embodiment, different sample selection strategies are used to perform sample selection operations based on different rewriting categories to which the information query request belongs. Then, model training is performed based on the positive and negative rewriting samples selected in the selection operation to obtain the request rewriting model, thereby ensuring the quality and effectiveness of the model training operation. Subsequently, the request rewriting operation is performed based on the request rewriting model, thus effectively ensuring the quality and efficiency of the request rewriting operation.

The utility model relates to a sampling device for paddy field deep soil, and relates to the technical field of soil sampling devices. The sampling device for the deep soil of the paddy field comprises a cylinder and a soil column cutting part, wherein a sampling hole penetrating through the two ends in the axial direction of the cylinder is formed in the cylinder; the barrel comprises a first half barrel and a second half barrel, and one side of the first half barrel is hinged to one side of the second half barrel; the other side of the first half cylinder is detachably connected with the other side of the second half cylinder through a locking structure; the first half cylinder and the second half cylinder are buckled and encircled to form a cylinder body and a sampling hole; one side of the first half cylinder or the second half cylinder is provided with an inserting channel, and the soil column cutting-off piece comprises a connecting rod and a cutting-off shovel fixedly connected to the end of the connecting rod; the cutting shovel can penetrate through the inserting channel to be inserted into the sampling hole to be used for cutting the soil column in the sampling hole. The sampling device is simple in structure, low in manufacturing and using cost, convenient and reliable to use and capable of efficiently sampling deep soil of the paddy field.