This invention provides a method for
metal interconnection of
flexible circuits, comprising the following steps:
coating a first
dielectric layer; depositing a first
metal layer and photolithographically
etching a first
metal pattern;
coating a second
dielectric layer and photolithographically
etching interlayer vias; depositing a second metal layer and photolithographically
etching a second metal pattern, wherein the second metal pattern overlaps with the first metal pattern;
coating a third
dielectric layer and photolithographically etching contact windows; and fabricating metal contacts. The beneficial effects of this invention are that the overlapping of the upper and lower metal layer patterns improves the reliability of vertical
interconnection between metal
layers, reduces lateral etching, improves etching accuracy, effectively avoids open circuits in
flexible circuits, enhances the
interconnection quality of
flexible circuits, improves the fracture resistance of fine lines in flexible circuits, facilitates high-density wiring in flexible circuits, constructs thick electrical contact points, reduces
contact resistance, improves
signal transmission quality, and enhances the
mechanical strength and
wear resistance of the contacts.