The method for manufacturing a
hydrogen permeation barrier comprises the steps ofa) depositing on a substrate (SUB) a layer
system (LS) comprising at least one layer (L1,L2,L3);characterized in that step a) comprises the step ofb) depositing at least one
hydrogen barrier layer (HPBL) comprising an at least ternary
oxide.The apparatus comprises a sealable volume and a wall forming at least a portion of a boundary limiting said volume, wherein said wall comprises a
hydrogen permeation barrier comprising a layer
system (LS) comprising at least one layer, wherein said layer
system comprises at least one hydrogen
barrier layer (HPBL) comprising an at least ternary
oxide.Preferably, said at least ternary
oxide is substantially composed of Al, Cr and O, and said depositing said at least one hydrogen
barrier layer (HPBL) is carried out using a
physical vapor deposition method, in particular a cathodic arc
evaporation method.Preferably, step a) comprises depositing on said substrate at least one of: an adhesion layer (AdhL), a
hydrogen storage layer (HStL), a protective layer (ProtL), in particular a thermal barrier layer (ThBL), a
diffusion barrier layer (DBL), an oxidation barrier layer (OxBL), a chemical barrier layer (ChBL), a
wear resistance layer (WRL).Excellent
hydrogen permeation barrier properties can be achieved, and the layer system can be tailored as required by an envisaged application.