The invention relates to a
graphene-based high-switch-ratio vertical organic
transistor and a preparation method thereof, and belongs to the technical field of
organic semiconductor devices. The
transistor comprises a first
metal electrode, a
rubrene single-
crystal active layer, a second
metal electrode, a single-layer
graphene electrode, a
silicon dioxide
dielectric layer and a
silicon substrate which are sequentially stacked from top to bottom, wherein the
silicon substrate is also used as a grid electrode. The
graphene electrode is prepared by a mechanical stripping method, and is transferred to the surface of
silicon dioxide at a low temperature of 50-120 DEG C after being pretreated by
ozone or
plasma to form a porous structure so as to improve the vertical
charge injection performance; the
rubrene single crystal active layer is deposited through a two-step sublimation method, high
crystal quality is obtained through annealing treatment, then the
rubrene single crystal active layer is transferred to the surface of the
graphene electrode by means of the flexible
polymer microneedle, and interface defects are reduced. And finally, respectively depositing
metal electrodes with the thickness of 20-80nm above and below the rubrene to construct a vertical organic
transistor structure. The device shows excellent switching performance under the condition of low
power consumption, the switching ratio is larger than 2.5 * 10 < 6 >, the off-state
current density is not larger than 10 [mu] A / cm < 2 >, and the device is suitable for flexible logic devices and neuromorphic calculation application.