5 results about "Surface reactivity" patented technology

Integrated devices including substrates with sample wells having modified surfaces are provided. An integrated device includes a substrate with a sample well having a metal oxide surface and a silica surface, a coating layer on the metal oxide surface formed by an amphipathic reagent attached to a polymeric compound, an antifouling overlay on the coating layer formed by a block copolymer, and a functionalizing agent bound to the silica surface.

The invention relates to the technical field of micro-nano manufacturing, in particular to nanoimprint template anti-sticking treatment equipment which comprises a reaction chamber and an anti-sticking reagent conveying system, and the whole process of template surface plasma activation, anti-sticking reagent quantitative conveying and low-temperature vapor deposition can be completed in the same chamber; precise control of a micro-upgrading reagent is achieved through a glue spraying valve and a multi-stage valve control system, low-temperature film forming is achieved in combination with a heating evaporation dish, the flexible template is prevented from being damaged by high temperature, the surface reaction activity is enhanced through plasma in-situ activation, and the adhesive force of an anti-sticking layer is improved. The invention solves the problems of dispersed process, uneven film layer, poor compatibility and the like of the traditional equipment, obviously improves the quality of the anti-sticking layer and the service life of the template, and is suitable for a high-precision nanoimprint process in the fields of semiconductors, optical devices and the like.

This invention discloses a wafer surface treatment process, comprising: providing a pre-cleaning chamber; introducing a wafer with an oxide layer formed on its surface into the pre-cleaning chamber and heating the wafer to 100°C to 300°C; introducing an etching gas with a first flow rate into the pre-cleaning chamber to perform a surface pre-treatment on the wafer for 1s to 3s; introducing the etching gas with a second flow rate, the second flow rate being less than the first flow rate, into the pre-cleaning chamber to remove the oxide layer on the surface of the wafer; wherein the pressure in the pre-cleaning chamber is maintained in the range of 0.8 Torr to 1.2 Torr. By synergistically utilizing temperature, flow rate, and pressure, the surface reactivity of the wafer is improved, the difference in reaction rates between new and old wafers is reduced, thereby ensuring the stability of the etching results.

The present application relates to the technical field of micro-nano manufacturing, and particularly relates to a nano-imprint template anti-adhesion treatment device, which comprises a reaction chamber and an anti-adhesion reagent conveying system, and can complete the whole process of template surface plasma activation, anti-adhesion reagent quantitative conveying and low-temperature vapor deposition in the same chamber; accurate control of microliter-level reagent is realized through a glue spraying valve and a multi-stage valve control system, low-temperature film forming is realized in combination with a heating evaporation dish, high-temperature damage to a flexible template is avoided, plasma in-situ activation enhances surface reactivity, and the adhesion of an anti-adhesion layer is improved. The present application solves the problems of process dispersion, uneven film layer and poor compatibility of traditional equipment, significantly improves the quality of the anti-adhesion layer and the service life of the template, and is suitable for high-precision nano-imprint processes in the fields of semiconductors, optical devices and the like.

The invention discloses a method for editing and regulating aromaticity and surface reaction activity of a nickel (II) norcorrole derivative through an oxygen bridging skeleton, a product of the method and application of the product, and belongs to the technical field of surface molecular science and molecular nanotechnology. In a solution phase pre-synthesis stage, a predetermined number of oxygen atoms are introduced into a pyrrole-pyrrole connecting bond of a nickel (II) norcorrole molecule, a determined number of C-O-C bridging structures are constructed and formed, and a precursor molecule with a programmable structure is obtained. The precursor is deposited on the surface of a metal single crystal and is subjected to a surface-assisted dehydrocyclization reaction after thermal annealing treatment, and oxygen atoms are retained and integrated into a final macrocyclic skeleton. The introduction of the oxygen bridge systematically regulates and controls the electronic structure and aromaticity distribution of the product, and further reconstructs the front line orbit space distribution. In the surface covalent coupling reaction, products not doped with oxygen are subjected to multi-path coupling to form products with different structures, and oxygen bridging products selectively form a single beta-beta site coupling structure.