The invention relates to a preparation method of a film bulk acoustic
resonator lower
electrode, which aims at solving the problems of an existing Mo (
molybdenum) film obtained by an ordinary process that the surface is rough, the structural and geometric uniformity is poor, the electric and acoustic performance can hardly meet the piezoelectric
pile electrode requirement, the characteristic difference between the Mo film and an AlN film is large and the combination strength is low. The preparation method comprises the following steps of: A, washing a monocrystal
silicon substrate material; B, carrying out the
ion cleaning on the surface of a monocrystal
silicon substrate; C, depositing the Mo film on the surface of the monocrystal
silicon substrate; D, carrying out the
nitrogen treatment on the surface of the Mo film. The Mo film
electrode prepared by the method is smooth in surface, low in coarseness, good in structural and geometric uniformity and excellent in electric and acoustic performance. The preparation method can be applicable to the technical field of an electronic material.