The present application relates to a kind of preparation methods of
niobium tube target material, belong to the preparation technical field of tubular target material for magnetron
sputtering, the present application uses
niobium powder as
raw material, designs special cold isostatic pressing tooling, successively after
granularity control proportioning and mechanical uniform mixing, cold isostatic pressing structure
assembly,
powder filling and cold isostatic pressing, cold isostatic pressing compact
machining,
hot isostatic pressing structure
assembly, vacuum hot degassing of sheath, sheath
hot isostatic pressing and
machining process preparation
niobium tube target material, the niobium tube target material prepared by the present application has the characteristics of
high density, uniform structure, small radial thickness deviation, good straightness, controllable length-
diameter ratio, and integral binding with back
tube forming, etc.,
coating film applicability is wide, test shows that its
relative density is ≥99%,
oxygen content is ≤2500ppm, structure is uniform, radial thickness deviation is ≤0.3mm, straightness is ≤1mm, length-
diameter ratio is controllable in the range of 8:1~20:1.