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12 results about "Organic tin compound" patented technology

Organotin compounds, sometimes called stannanes, are chemical compounds with tin–carbon bonds. Of the compounds of tin, the organic derivatives are the most useful commercially. Some organotin compounds are highly toxic and have been used as biocides.

Tin compounds and resist solutions using the same, pattern forming method, thin film, patterned thin film, and method for producing tin compounds

Provided is a tin compound that is a high-performance resist material capable of having high purity and uniform solubility. A tin compound having a tin atom, an organic group R, and an oxygen ligand and / or a hydroxyl ligand, wherein the diffraction angle 2θ (°) of the peak of the maximum intensity in X-ray diffraction measurement is present in the range of 5.00° to 15.00°, the half-value width of the peak of the maximum intensity is in the range of 1.00° to 4.00°, and the aforementioned organic group R has 1 to 30 carbon atoms.
Owner:MITSUBISHI CHEM CORP +1

Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods

PendingUS20260176294A1Tin organic compoundsPhysical chemistryAmidogen
A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.
Owner:INPRIA CORP

Method for recovering tin from silver separation residue by using sulphur concentrate

The application discloses a method for recovering tin from silver separation residue by using sulfur concentrate, and comprises the following steps: S1, uniformly mixing copper anode slime silver separation residue, an additive and sulfur concentrate to form spherical materials; S2, roasting the spherical materials under a protective atmosphere at a temperature of 300-800 DEG C to generate soluble sulfur-tin compounds, and obtaining roasting residue; S3, grinding the roasting residue into roasting residue powder, mixing the roasting residue powder with alkali metal salt water to carry out tin leaching reaction in an alkaline environment, and obtaining tin leaching liquid; and S4, mixing the tin leaching liquid, an oxidizing agent and a calcium-containing reagent to carry out tin precipitation reaction, filtering and drying, and obtaining tin concentrate. The application has the advantages of low cost.
Owner:JIANGXI COPPER TECHNOLOGY RESEARCH INSTITUTE CO LTD

Tin compounds, tin compositions, methods of making the same, resist solutions, pattern forming methods, thin films, patterned thin films, and methods of making substrates

Provided is a tin compound that is a high-performance resist material by having solubility, hydrophobicity, resist sensitivity, and the like in balance. A tin compound that is a tin compound having a tin atom, an organic group R, and an oxygen ligand and / or a hydroxyl ligand, wherein two or more of the organic group R having 1 to 30 carbon atoms are contained in one molecule of the tin compound, and a Sn-O-Sn structure is contained.
Owner:MITSUBISHI CHEM CORP +1

A method for the electrocatalytic synthesis of polysubstituted ribose derivatives and nucleoside analogs thereof

PendingCN122279622Ahigh stereoselectivityHigh regional selectivityReaction temperaturePharmaceutical drug
This application provides a method for the electrocatalytic synthesis of multisubstituted ribose derivatives, comprising using an organotin compound as a catalyst to catalyze the reaction of the compound shown in formula (I) under electrochemical conditions to obtain the compound shown in formula (II); wherein, R 1 C is an optional replacement 1‑10 hydrocarbon group; R 2 and R 3 One of them is -C(=O)OR, and the other is -H; R is the C that can be substituted. 1‑4 Alkyl; R 4 C is a hydrogen atom or an optional substituted C 1‑10 The method involves the use of a hydrocarbon group as the reaction solvent, a reaction temperature of 40-80℃, and a quaternary ammonium bromide as the electrolyte. This method enables the efficient and highly stereoselective synthesis of tetrasubstituted riboses modified with 2'- and 3'-ester groups, and is easily scaled up, showing promising prospects for industrial application. The products obtained by this method possess excellent potential for later derivatization and can be used to synthesize various novel nucleoside analogs, demonstrating significant application value in the development of antiviral and antitumor drugs.
Owner:XIAMEN UNIV

Methods for preparing organotin compounds

ActiveCN116888133BTin organic compoundsCombinatorial chemistryExtreme ultraviolet
This invention provides a convenient method for preparing certain organotin compounds having alkyl and alkylamino or alkyl and alkoxy substituents. The method provides the organotin compounds in high-purity form, which are particularly suitable as precursors for depositing high-purity tin oxide films in extreme ultraviolet (EUV) lithography techniques, for example, for the manufacture of certain microelectronic devices.
Owner:ENTEGRIS INC

Process for the preparation of organotin compounds

The invention provides an efficient and effective process for preparing certain organotin compounds having alkyl and alkylamino substituents. The process provides organotin compounds in high purity crystalline form that are particularly suitable for use as precursors for depositing high purity tin oxide films in, for example, extreme ultraviolet (EUV) photolithography techniques used in the manufacture of certain microelectronic devices.
Owner:ENTEGRIS INC

Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods

PendingUS20260138997A1Tin organic compoundsPhotomechanical coating apparatusPhysical chemistryAmidogen
A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.
Owner:INPRIA CORP

A tin-titanium oxide catalyst and its preparation and use

PendingCN122252169AOrganic chemistryCatalyst activation/preparationTin dioxideFurfurylamine
The application discloses a tin-titanium oxide catalyst and a preparation and application thereof. The catalyst is obtained by calcining after mixing titanium oxide and an organic tin compound uniformly, the catalyst takes the titanium oxide as a carrier and loads the tin dioxide, and the loading mass of the tin dioxide accounts for 20-30% of the mass of the catalyst. Furfurylamine and acrylic acid are reacted in a solvent and the catalyst in a reaction kettle at a certain temperature for a certain time to obtain isoindole ketone. The method has the advantages of high isoindole ketone yield, simple and easily obtained raw materials, simple operation, economy, environmental protection and wide substrate applicability.
Owner:NANJING TECH UNIV