59 results about "Organic tin compound" patented technology

This invention belongs to the field of vanadium redox flow batteries, specifically relating to a vanadium redox flow battery precursor, a vanadium redox flow battery, and a method for preparing the same. The vanadium redox flow battery precursor of this invention includes a positive electrode electrolyte precursor and a negative electrode electrolyte precursor; the positive electrode electrolyte precursor includes vanadium ions, an inorganic acid, a positive electrode side reaction inhibitor precursor, and a solvent; wherein the positive electrode side reaction inhibitor precursor is aniline; the inorganic acid includes hydrochloric acid; the negative electrode electrolyte precursor includes vanadium ions, an inorganic acid, a negative electrode side reaction inhibitor precursor, and a solvent; wherein the negative electrode side reaction inhibitor precursor is a metal compound; the metal compound is selected from one or more of tin compounds, bismuth compounds, and antimony compounds; the inorganic acid includes hydrochloric acid.

This invention provides a temperature-resistant shape memory polymer plugging agent, its preparation method, and its application, belonging to the field of oil and gas drilling technology. The preparation method of this plugging agent includes the following steps: mixing acetic acid and perchloric acid to obtain a mixed acid, then adding bromate, potassium permanganate, and natural flake graphite, and stirring to obtain low-temperature expanded graphite; mixing cyanate ester, linear aliphatic epoxy resin, and an active diluent, then adding low-temperature expanded graphite, organotin compounds, and amine catalysts, and carrying out a curing reaction to obtain a temperature-resistant shape memory polymer material; testing the glass transition temperature (Tg) of the synthesized temperature-resistant shape memory polymer material, compressing it at (Tg+5)~(Tg+10)℃, and then cooling, pulverizing, and granulating to obtain the final product. The plugging agent of this invention can rapidly recover its original shape at high temperatures, accumulate and seal leakage channels, and form a high-strength sealing layer in fractures, meeting the requirements of safe and efficient drilling.

The invention relates to a modified geopolymer and a modified geopolymer composite comprising an additive. The additive is preferably a radiopaque additive. The modification is carried out using one or more water-soluble compounds, which are preferably selected from phosphorous compounds, nitrogen compounds, copper compounds, silver compounds, zinc compounds, tin compounds, and magnesium compounds. In addition, the invention relates to compositions containing the modified geopolymer or the modified geopolymer composite. These compositions preferably comprise a vinyl aromatic polymer and are in the form of a foam.

Provided is a tin compound that is a high-performance resist material capable of having high purity and uniform solubility. A tin compound having a tin atom, an organic group R, and an oxygen ligand and / or a hydroxyl ligand, wherein the diffraction angle 2θ (°) of the peak of the maximum intensity in X-ray diffraction measurement is present in the range of 5.00° to 15.00°, the half-value width of the peak of the maximum intensity is in the range of 1.00° to 4.00°, and the aforementioned organic group R has 1 to 30 carbon atoms.

To provide a resist composition having high sensitivity and being able to form a pattern with a low exposure amount. A resist composition containing an organic tin compound and an organic boron compound represented by the following formula. (In the formula, R1, R2, and R3 each independently represent an organic group that bonds to boron by a carbon atom, an oxygen-containing organic group that bonds to boron by an oxygen atom, or OH. The oxygen-containing organic group may contain a boron atom. Two groups selected from the group consisting of R1, R2, and R3 may link to form a ring structure.)

A method for storing organotin compounds and an article that is particularly useful for maintaining the high purity of organotin compounds for semiconductor applications is described. The method for storing an organotin compound involves storing the organotin compound in a container and filling the headspace of the container with an inert gas, in which the container is a multilayer resin container containing, at least a light-shielding layer, a gas barrier layer, and an innermost layer, and the material constituting the innermost layer in contact with the organotin compound includes perfluoroalkoxyalkane, polytetrafluoroethylene, phenol resin, and / or ultra-high molecular weight polyethylene.

A semiconductor photoresist composition comprising an organotin compound represented by Chemical Formula 1 and a solvent; a method for preparing the same; and a method for forming a pattern using the same. The semiconductor photoresist composition has excellent sensitivity, resolution, and storage stability. Specific details of Chemical Formula 1 are defined in the specification.[Chemical Formula 1]

A composition including a fluorine-containing polymer, at least one carboxylic acid compound selected from a dicarboxylic acid compound having a specific structure and a monocarboxylic acid compound having a specific structure; and at least one cross-linking compounding agent selected from a primary amine compound, a secondary amine compound, an inorganic nitride, an organic tin compound, a peroxide cross-linking agent, a polyol cross-linking agent, a polyamine cross-linking agent, an oxazole cross-linking agent, an imidazole cross-linking agent, and a thiazole cross-linking agent. Also disclosed is a molded article obtained from the composition.

A method for storing organotin compounds and an article that is particularly useful for maintaining the high purity of organotin compounds for semiconductor applications is described. The method for storing an organotin compound involves storing the organotin compound in a container and filling the headspace of the container with an inert gas, in which the container is a multilayer resin container containing, at least a light-shielding layer, a gas barrier layer, and an innermost layer, and the material constituting the innermost layer in contact with the organotin compound includes perfluoroalkoxyalkane, polytetrafluoroethylene, phenol resin, and / or ultra-high molecular weight polyethylene.

Organotin compositions suitable for radiation-based patterning have ligands that provide a fluorinated group and an unsaturated carbon-carbon bond, such as a C=C bond. The fluorinated group and the unsaturated carbon-carbon bond may or may not be located on the same ligand. Blends of precursors with different ligands provide additional flexibility in precursor design. Fluorinated organometallic compounds are given by formula R UF It can be expressed by Sn(OR')3, where R UF R' is an organic group consisting of 1 to 31 carbon atoms, having at least one C=C bond and at least one fluorine atom bonded to carbon, and this organic group forms a C-Sn bond, while R' is an organic group consisting of 1 to 10 carbon atoms. The precursor is suitable for liquid-phase or gas-phase deposition.

A method for storing organotin compounds and an article that is particularly useful for maintaining the high purity of organotin compounds for semiconductor applications is described. The method for storing an organotin compound involves storing the organotin compound in a container and filling the headspace of the container with an inert gas, in which the container is a multilayer resin container containing, at least a light-shielding layer, a gas barrier layer, and an innermost layer, and the material constituting the innermost layer in contact with the organotin compound includes perfluoroalkoxyalkane, polytetrafluoroethylene, phenol resin, and / or ultra-high molecular weight polyethylene.

A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

The application provides a method for electrochemically recycling tin and zinc resources from electronic waste, and belongs to the field of solid waste resource recycling. The method comprises the following processes: grinding electronic waste containing tin and zinc into ore powder. Disperse calcium salt, L-5-hydroxy tryptophan and ore powder in a solvent, and adjust the pH to alkaline to obtain an ore slurry. Electrolyze the ore slurry to obtain a cathode product containing tin and zinc, a liquid phase product containing tin and zinc, and a solid residue. The tin and zinc containing cathode product and the tin and zinc containing liquid phase product are post-treated to obtain tin compounds and zinc compounds. The working potential of electrolysis is 0.5 V vs. SCE-2 V vs. SCE. Through the precise coupling of the designed functional molecules and the electrochemical conditions, the selective activation, transmission and directional synthesis of the target metal at the molecular level are realized.

The invention relates to the technical field of high polymer material recovery and regeneration processing, and particularly discloses a method for preparing a non-toxic transparent calendered film from a waste PVC film. The method sequentially comprises the steps of synergistic cleaning of a bio-enzyme-containing preparation, deep devolatilization purification under the synchronous action of ultraviolet rays, microwaves and superheated steam, composite surface treatment of a specific chelating agent and an organic tin compound, and blending modification with components such as a surface-modified nano reinforcing agent. And finally, a controllable mechanical oscillation field is introduced in the calendaring forming stage for on-line structure regulation and control, so that a final product is obtained. According to the method, efficient removal of harmful impurities in the waste PVC raw material and active optimization of a microstructure are achieved, the prepared calendered film has the comprehensive advantages of being low in heavy metal and plasticizer residues, high in light transmittance, small in haze and good in longitudinal tensile strength, and an effective solution is provided for high-valued regeneration of the waste PVC film.

To provide an alloy resin excellent in the balance between fluidity in melting and heat resistance in curing.SOLUTION: A polymer alloy comprising a polyvinyl chloride (A), a (meth) acrylic resin (B), and a stabilizing agent (C), wherein the stabilizing agent (C) comprises a liquid organotin compound (c1) that is liquid at 20 °C and a powdery organotin compound (c2) that is powdery at 20 °C. It is preferable that the melt flow rate (210 °C., load: 98N) of the alloy resins is 20g / 10 minutes or more, and the deflection temperature under load of the alloy resins is 80 °C. or more.SELECTED DRAWING: None

The invention relates to the technical field of ceramic surface metallization, and discloses nano nickel powder slurry with high dispersion stability and a preparation method and application thereof.According to the slurry, pure nickel powder is replaced with Ni-Sn alloy powder, tin reacts with sulfur preferentially to generate a SnS protection layer, a sulfur source is consumed to protect a nickel core, an organic tin compound is added into the slurry to serve as an in-situ repairing agent, and the surface of the nano nickel powder is repaired. Active Sn < 2 + > is decomposed and released in the rubber discharging stage and migrated to the surface defect position to be combined with sulfur, repairing of a protection layer is achieved, a weak coordination type dispersing agent is adopted, steric hindrance is provided through hydrogen bonds and Van der Waals force to maintain storage stability, meanwhile, interference of a strong anchoring group on tin migration is avoided, the adding time of organic tin is controlled through a step-by-step feeding process, and the stability of the organic tin is improved. And a compact SnS protection layer is formed in cooperation with slow heating, nickel cores are exposed after complete decomposition at high temperature, the long-term dispersion stability of the slurry in a sulfur-containing system is achieved, and the method is suitable for manufacturing of an MLCC inner electrode.

A bonding structure used for forming a sealed space (for example, a container) for containing or transferring an organotin compound, wherein the bonding structure is a structure in which a first metal member (for example, a lid of the container) is connected to a second metal member (for example, a container body of the container) via a metal gasket or a metal O-ring, and the metal gasket or the metal O-ring has a surface having a Vickers hardness set to be not less than lower than a Vickers hardness of a surface of a portion of the metal member, the portion being contacted with the metal gasket or the metal O-ring.

The application discloses a method for recovering tin from silver separation residue by using sulfur concentrate, and comprises the following steps: S1, uniformly mixing copper anode slime silver separation residue, an additive and sulfur concentrate to form spherical materials; S2, roasting the spherical materials under a protective atmosphere at a temperature of 300-800 DEG C to generate soluble sulfur-tin compounds, and obtaining roasting residue; S3, grinding the roasting residue into roasting residue powder, mixing the roasting residue powder with alkali metal salt water to carry out tin leaching reaction in an alkaline environment, and obtaining tin leaching liquid; and S4, mixing the tin leaching liquid, an oxidizing agent and a calcium-containing reagent to carry out tin precipitation reaction, filtering and drying, and obtaining tin concentrate. The application has the advantages of low cost.

The present invention relates to a process for preparing a polyester of glycerol and a dicarboxylic acid, the process comprising: (a) contacting monomers comprising at least glycerol and dicarboxylic acid in the presence of water in an inert atmosphere at a temperature of less than 100 DEG C wherein the molar ratio of glycerol / dicarboxylic acid ranges from 0.5 / 1 to 10 / 1; (b) carrying out esterification in an inert atmosphere at a temperature higher than 110 DEG C; (c) at a temperature higher than 110 DEG C, vacuumizing the reaction medium to a pressure lower than 100 mbar; (d) maintaining a vacuum and a temperature above 110 DEG C to carry out polycondensation, said process comprising: at the end of the esterification of step (b), before or after the evacuation of step (c), introducing a polycondensation catalyst in an amount of less than or equal to 5000 ppm with respect to the total weight of monomers, said catalyst being a tin-based food grade catalyst, the organic tin compounds are selected from organic tin compounds containing carboxyl functional groups (-C (O) OH), organic tin compounds containing functional groups (-Sn (O) OH) and mono-butyltin tris (2-ethylhexanoate). The present invention relates to a process for synthesizing glycerol polyesters having a residual monomer content of less than 5% by weight, based on the weight of the polymer, a high number average molar mass Mn of greater than 2500 g / mol, a dispersity of less than or equal to 10 and a 1, 2, 3-triacylglyceride unit content of less than 15 mol% with respect to all units of the polymer, in particular to the synthesis of glycerol polyesters having a residual monomer content of less than 5% by weight, based on the weight of the polymer, a high number average molar mass Mn of greater than 2500 g / mol.

Polynuclear tin compounds and related methods are provided. One method comprises obtaining a monosubstituted tin (IV) amide compound; a silanol compound is obtained; and contacting the monosubstituted tin (IV) amide compound with the silanol compound to form a polynuclear tin compound. A composition includes a polynuclear tin compound.

Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe2)3 are described. R1 is selected from RA, RB, and RC; RA is a primary alkyl group having about 1 to 10 carbon atoms, RB is a secondary alkyl group having about 3 to 10 carbon atoms, and RC is a tertiary alkyl group having about 3 to 10 carbon atoms; each R2 is independently an alkyl group having about 1 to 10 carbon atoms; and a content of R1Sn(NR22)2(N(R2)CH2NR22) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.

A method of synthesizing a monosubstituted tin compound includes: contacting a stannous halide with a metallization reactant to form a stanene compound; contacting the stanene compound with a halide compound to form a tin-containing compound; and contacting the tin-containing compound with a reactant to form a monosubstituted tin compound via ligand exchange. Also provided are compositions including the monosubstituted tin compounds, as well as other compositions and methods.

Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe2)3 are described. R1 is selected from RA, RB and RC; RA is a primary alkyl group having about 1 to 10 carbon atoms, RB is a secondary alkyl group having about 3 to 10 carbon atoms, and RC is a tertiary alkyl group having about 3 to 10 carbon atoms; each R2 is independently an alkyl group having about 1 to 10 carbon atoms; and a content of R1Sn(NR22)2(N(R2)CH2NR22) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.

The invention provides a temperature-resistant shape memory polymer plugging agent as well as a preparation method and application thereof, and belongs to the technical field of petroleum and natural gas drilling. The preparation method of the plugging agent comprises the following steps: mixing acetic acid and perchloric acid to obtain mixed acid, then adding bromate, potassium permanganate and natural crystalline flake graphite, and carrying out stirring reaction to obtain low-temperature expanded graphite; the preparation method comprises the following steps: mixing cyanate ester, straight-chain aliphatic epoxy resin and a reactive diluent, then adding low-temperature expanded graphite, an organic tin compound and an amine catalyst, and carrying out a curing reaction to obtain the temperature-resistant shape memory polymer material, testing the glass transition temperature Tg of the synthesized temperature-resistant shape memory polymer material, compressing at (Tg + 5)-(Tg + 10) DEG C, cooling, crushing and granulating to obtain the temperature-resistant shape memory polymer material. The plugging agent disclosed by the invention can quickly recover to the original shape at high temperature, is stacked to plug a leakage channel, forms a high-strength plugging layer in a crack, and meets the requirements of safe and efficient drilling.

Flux formulations and joining method A solder flux comprising: one or more amines; a zinc compound; and an organotin compound.

The application relates to the technical field of metal paste, and discloses a tin-doped copper-silver paste with a compounded organic carrier and a preparation method thereof, which comprises the following raw materials in percentage by mass: silver-tin-copper mixed metal powder 60-80 parts, bismuth-boron-zinc mixed glass powder 5-10 parts and organic carrier 20-30 parts; the silver-tin-copper mixed metal powder comprises the following raw materials in percentage by mass: silver powder 80-90%, tin powder 0-10% and copper powder 0-10%; and the average particle size of the silver-tin-copper mixed metal powder is 1-5 mu m. In the application, spherical silver powder is used as a solid-phase main raw material, tin powder and copper powder are used to replace part of the silver powder, when the silver paste is sintered, silver and tin form upper and lower layer structures and silver-tin compounds between the two layers. When the sintering is finished, the metal silver layer is solidified by cooling, the upper surface is an air surface, the air surface can release the stress generated by thermal expansion and cold contraction, and does not cause tearing of the glass, so that the vacuum glass welding effect is improved.

Aspects of the disclosure relate to methods for producing organotin compounds with high purity, which may involve the use of specific additives or reaction conditions. Methods for purifying organotin compounds and suppressing the formation of impurities in organotin compounds are also described.

Precursors useful for forming tin-containing films are provided. The precursors include functionalized tin compounds in which one or more ligands are coordinated to Sn and the Sn is functionalized with at least one functional group. Methods for forming the precursors and for forming tin-containing films using the precursors are also provided.

To provide a thin film forming method for depositing a good quality thin film using an organotin compound.SOLUTION: An organotin compound is represented by the following formula, where L1 and L2 are independently selected from an alkoxy group and an alkylamino group, R1 is a substituted / unsubstituted C6-8 aryl group, and R2 is selected from a substituted / unsubstituted C1-4 linear alkyl group, a C2-4 allyl group and the like.SELECTED DRAWING: Figure 2a

Monoorgano tin compounds having chemical formula R′SnX3 and high purity are described. R′ is an optionally substituted hydrocarbyl group, X is selected from NR2 and OR, and each R is independently a linear or branched alkyl group having about 1 to about 10 carbon atoms. Methods for synthesizing and purifying these compounds are also provided. The monoorgano tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of diorgano tin impurities.