The invention relates to a preparation method of a
hardness-adjustable
microstructure antireflection film for a
solar cell cover plate, and the method comprises the steps: S1, preparing a
coating sol emulsion: mixing a precursor of a film forming material with an
alcohol solvent, adjusting the pH value of a
reaction system to be acidic or alkaline, and carrying out a first-stage stirring reaction; adjusting the
reaction system to be slightly neutral or slightly acidic, adding a thermally-decomposable pore-forming
emulsion and an emulsifier, carrying out a second-stage stirring reaction, and aging to obtain a
coating sol emulsion; s2,
coating and heat treatment: coating the surface of a glass substrate with the coating
sol emulsion by adopting a
roller coating method, and then carrying out heat treatment on the coated glass substrate; the heat treatment comprises preheating treatment for preliminarily curing the thin film and a
tempering process for
tempering the glass substrate and completely curing the thin film at the same time; in the
tempering process, the pore-forming emulsion is pyrolyzed, and a
porous microstructure is formed in the cured film. The
hardness of the thin film can be effectively regulated and controlled, and the high anti-reflection effect is achieved through the
microstructure.