The invention discloses a high-transmissivity amorphous
zinc nitride film and a preparation method thereof, and relates to the technical field of
semiconductor film materials.The preparation method comprises the following steps that firstly, a
quartz substrate is selected as a substrate,
metal zinc is selected as a
sputtering target material, the distance between the substrate and the target material is adjusted, and a vacuum cavity cover is covered; vacuumizing, heating the substrate, introducing
nitrogen and
argon into a vacuum cavity, and pre-
sputtering the
metal zinc in a
radio frequency magnetron
sputtering mode without opening a target baffle; opening a target baffle, performing
radio frequency magnetron sputtering on the pre-sputtered
metal zinc, and depositing a
zinc nitride film on the substrate; and finally, carrying out cooling treatment to obtain the amorphous
zinc nitride film. According to the high-transmissivity amorphous
zinc nitride film and the preparation method thereof, key parameters such as sputtering air pressure are controlled within a specific range, the growth
kinetics of the film is effectively regulated and controlled, and the average transmissivity of the prepared amorphous zinc
nitride film in a visible-
near infrared light region is as high as 73%-86.6%.