The embodiment of the invention provides an
evaporation structure, a radiator, a
semiconductor device and a preparation method. The preparation method of the
evaporation structure comprises the steps that: a substrate is provided, a bottom plate, a side plate connected with the bottom plate, and a plurality of
backflow pieces arranged on the bottom plate at intervals are formed on the substrate, a liquid filling opening is formed in the side plate, the side plate surrounds the bottom plate, so that a cavity with an opening is formed in the substrate; capillary structure
layers are formed on the inner surface of the bottom plate, the inner surface of the side plate and the surfaces of the
backflow pieces; a base top is provided, a protection piece is arranged in a
welding area of the base top, and a capillary structure layer is formed on the side, provided with the protection piece, of the base top to form a top plate; the protection piece is separated from the top plate, so that a
welding area can be exposed; the
welding area of the top plate corresponds to the side plate and the
backflow pieces, the top plate, the side plate and the backflow pieces are welded and fixed through the welding area, and the opening is sealed so that the bottom plate, the top plate and the side plate can be matched to form an
evaporation cavity; evaporating liquid is injected through the liquid filling opening, and the liquid filling opening is sealed to form an evaporation structure.