The invention provides a design of a deep
cut-off negative
optical filter. At present, the design thought of a negative
optical filter film
system mainly applies the main level of a reflecting film
system, but the performance of a deep
cut-off
wave band and a transmission
wave band is difficult to guarantee at the same time when the
cut-off
wave band width is between the main level cut-off width. The
optical filter is divided into a front film
system and a rear film system, and a high-level reflection band is applied, so that the optical filter achieves the purposes of deep cut-off and
high transmission. The front
surface film system structure and the rear
surface film system structure are Sub (mHnL) S1Air and Sub (pHqL) S2Air respectively, Sub is a substrate, (mHnL) S1 and (pHqL) S2 are optical filter film systems, Air is air, m, n, p and q are matching coefficients of different materials, Chebyshev polynomial characterization shows that the three-level reflection
band width depends on the matching coefficients of the materials, the matching coefficients of the different materials are added to form a fixed value, S1 and S2 are film system cycles, and m, n, p and q are the number of cycles of the film systems. H and L respectively represent
lambda / 4 optical thicknesses of the high-refractive-index material and the low-refractive-index material, and
lambda is a reference
wavelength. The design provided by the invention can be widely applied to the design of the deep cut-off negative optical filter.