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51 results about "Biphenylol" patented technology

Fluorescence-enhanced probe compound preparation method and trivalent chromium ion detection method

The invention relates to a novel fluorescence-enhanced probe compound preparation method and a trivalent chromium ion detection method. The chromium ion fluorescence-enhanced probe compound has a structure shown in the formula I. The preparation method comprises mixing 4'-Hydroxy-4-biphenylcarbonitrile, anhydrous magnesium chloride and anhydrous triethylamine in an acetonitrile solvent in a nitrogen protective atmosphere, adding paraformaldehyde into the mixture, carrying out reflux to obtain an intermediate product, carrying out reflux on the intermediate product, 2-chloropyridine hydrochloride, anhydrous potassium carbonate and potassium iodide in an acetonitrile solvent to obtain a second intermediate product, mixing the second intermediate product, phenanthraquinone and ammonium acetate in an ethanol solvent, and carrying out a reaction process in the presence of acetic acid as a catalyst to obtain a desired product probe. The fluorescence-enhanced probe compound has good selectivity and sensitivity to trivalent chromium ions and has a fast response speed. The trivalent chromium ion detection method has a simple sample pretreatment process and is suitable for detection of a trace amount of trivalent chromic ions in water and in the environment.
Owner:UNIV OF JINAN

Aqueous dispersion for chemical mechanical polishing

The invention provides an aqueous dispersion for chemical mechanical polishing that can limit scratches of a specific size to a specific number, even with interlayer insulating films with small elastic moduli (silsesquioxane, fluorine-containing SiO2, polyimide-based resins, and the like.). When using the aqueous dispersion for chemical mechanical polishing of an interlayer insulating film with an elastic modulus of no greater than 20 GPa as measured by the nanoindentation method, the number of scratches with a maximum length of 1 μm or greater is an average of no more than 5 per unit area of 0.01 mm2 of the polishing surface. An aqueous dispersion for CMP or an aqueous dispersion for interlayer insulating film CMP according to another aspect of the invention contains a scratch inhibitor agent and an abrasive. The scratch inhibitor may be biphenol, bipyridyl, 2-vinylpyridine, salicylaldoxime, o-phenylenediamine, catechol, 7-hydroxy-5-methyl-1,3,4-triazaindolizine, and the like. The abrasive may consist of inorganic particles, organic particles or organic/inorganic composite particles. The organic/inorganic composite particles may be formed by polycondensation of an alkoxysilane, aluminum alkoxide, titanium alkoxide, and the like in the presence of polymer particles of polystyrene or the like, and bonding of polysiloxane, and the like, on at least the surface of the polymer particles.
Owner:TOSHIBA MEMORY CORP
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